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Title: Planarization of optical substrates

Abstract

Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1495678
Patent Number(s):
10175391
Application Number:
14/434,699
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Classifications (CPCs):
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Jan 25
Country of Publication:
United States
Language:
English

Citation Formats

Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, and Patel, Dinesh. Planarization of optical substrates. United States: N. p., 2019. Web.
Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, & Patel, Dinesh. Planarization of optical substrates. United States.
Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, and Patel, Dinesh. Tue . "Planarization of optical substrates". United States. https://www.osti.gov/servlets/purl/1495678.
@article{osti_1495678,
title = {Planarization of optical substrates},
author = {Stolz, Christopher and Folta, Jim and Mirkarimi, Paul B. and Soufli, Regina and Walton, Christopher C. and Wolfe, Justin and Menoni, Carmen and Patel, Dinesh},
abstractNote = {Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {1}
}

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Works referenced in this record:

Laser intensification by spherical inclusions embedded within multilayer coatings
journal, January 2006


Nodular defect planarization for improved multilayer mirror laser resistance
conference, January 2013


Influence of process conditions on the optical properties HfO 2 /SiO 2 thin films for high power laser coatings
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  • Langdon, B.; Patel, D.; Krous, E.
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Using engineered defects to study laser-induced damage in optical thin films with nanosecond pulses
conference, November 2011


High laser-resistant multilayer mirrors by nodular defect planarization [Invited]
journal, January 2014