Planarization of optical substrates
Abstract
Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1495678
- Patent Number(s):
- 10175391
- Application Number:
- 14/434,699
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2013 Jan 25
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, and Patel, Dinesh. Planarization of optical substrates. United States: N. p., 2019.
Web.
Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, & Patel, Dinesh. Planarization of optical substrates. United States.
Stolz, Christopher, Folta, Jim, Mirkarimi, Paul B., Soufli, Regina, Walton, Christopher C., Wolfe, Justin, Menoni, Carmen, and Patel, Dinesh. Tue .
"Planarization of optical substrates". United States. https://www.osti.gov/servlets/purl/1495678.
@article{osti_1495678,
title = {Planarization of optical substrates},
author = {Stolz, Christopher and Folta, Jim and Mirkarimi, Paul B. and Soufli, Regina and Walton, Christopher C. and Wolfe, Justin and Menoni, Carmen and Patel, Dinesh},
abstractNote = {Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {1}
}
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