skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Lithographic patterning

Abstract

This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

Inventors:
; ; ;
Issue Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1493607
Patent Number(s):
10126652
Application Number:
15/269,202
Assignee:
Brookhaven Science Associates, LLC (Upton, NY)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC02-98CH10886; SC0012704
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Sep 19
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Lithographic patterning. United States: N. p., 2018. Web.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, & Yager, Kevin G. Lithographic patterning. United States.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Tue . "Lithographic patterning". United States. https://www.osti.gov/servlets/purl/1493607.
@article{osti_1493607,
title = {Lithographic patterning},
author = {Black, Charles Thomas and Stein, Aaron and Wright, Gwen and Yager, Kevin G.},
abstractNote = {This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {11}
}

Patent:

Save / Share:

Works referenced in this record:

Phase Behavior of Pure Diblocks and Binary Diblock Blends of Poly(ethylene)−Poly(ethylethylene)
journal, January 1996


Guiding Polymers to Perfection:  Macroscopic Alignment of Nanoscale Domains
journal, February 2004


Polymers confined between two parallel plane walls
journal, January 2004


Millisecond Ordering of Block Copolymer Films via Photothermal Gradients
journal, February 2015


Determination of the Micelle Architecture of Polystyrene/Poly(4-vinylpyridine) Block Copolymers in Dilute Solution
journal, June 1994


Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large
journal, January 2013


Immiscibility of large and small symmetric diblock copolymers
journal, August 1995


Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing
journal, November 2011


One-Component Approximation for Binary Diblock Copolymer Blends
journal, October 1995


Enabling complex nanoscale pattern customization using directed self-assembly
journal, December 2014


Design rules for self-assembled block copolymer patterns using tiled templates
journal, February 2014


Long-Range Order and Orientation of Cylinder-Forming Block Copolymers on Chemically Nanopatterned Striped Surfaces
journal, May 2006


Complex self-assembled patterns using sparse commensurate templates with locally varying motifs
journal, March 2010


Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates
journal, August 2008


Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
journal, June 2012


Selective directed self-assembly of coexisting morphologies using block copolymer blends
journal, August 2016


Structural study of mixtures of styrene isoprene two- and three-block copolymers
journal, March 1982


Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer
journal, June 2009


Ordered Structure in Blends of Block Copolymers. 3. Self-Assembly in Blends of Sphere- or Cylinder-Forming Copolymers
journal, July 1994


Controlling interfacial interactions for directed self assembly of block copolymers
journal, May 2014

  • Stein, Gila E.; Mahadevapuram, Nikhila; Mitra, Indranil
  • Journal of Polymer Science Part B: Polymer Physics, Vol. 53, Issue 2, p. 96-102
  • https://doi.org/10.1002/polb.23502

Effects of Lateral Confinement on Order in Spherical Domain Block Copolymer Thin Films
journal, September 2003


Ordered Structure in Blends of Block Copolymers.2.Self-Assembly for Immiscible Lamella-Forming Copolymers
journal, November 1994


Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates
journal, January 2007


Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
journal, August 2008


Evolution of block-copolymer order through a moving thermal zone
journal, January 2010


Sacrificial-Post Templating Method for Block Copolymer Self-Assembly
journal, July 2013


Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up
journal, October 2006


Phase Behavior in Thin Films of Cylinder-Forming Block Copolymers
journal, June 2002


Orientational Order in Block Copolymer Films Zone Annealed below the Order−Disorder Transition Temperature
journal, September 2007


Dynamics of pattern coarsening in a two-dimensional smectic system
journal, July 2002


Gaussian- to stretched-coil transition in block copolymer melts
journal, August 1990


Self-Assembled Phases of Block Copolymer Blend Thin Films
journal, October 2014