Title: Lithographic patterning

Abstract

This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

Inventors:

Black, Charles Thomas; Stein, Aaron; Wright, Gwen; Yager, Kevin G.

Issue Date:

2018-11-13

Research Org.:

Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1493607

Patent Number(s):

10126652

Application Number:

15/269,202

Assignee:

Brookhaven Science Associates, LLC (Upton, NY)

Patent Classifications (CPCs):

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/0002 - {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
G03F7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F7/162 - {Coating on a rotating support, e.g. using a whirler or a spinner}
G03F7/168 - {Finishing the coated layer, e.g. drying, baking, soaking}
G03F7/2037 - {Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation}
G03F7/325 - {Non-aqueous compositions}
G03F7/40 - Treatment after imagewise removal, e.g. baking

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DOE Contract Number:  

AC02-98CH10886; SC0012704

Resource Type:

Patent

Resource Relation:

Patent File Date: 2016 Sep 19

Country of Publication:

United States

Language:

English

Subject:

47 OTHER INSTRUMENTATION