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Title: Lithographic patterning


This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

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Issue Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
OSTI Identifier:
Patent Number(s):
Application Number:
Brookhaven Science Associates, LLC (Upton, NY)
DOE Contract Number:  
AC02-98CH10886; SC0012704
Resource Type:
Resource Relation:
Patent File Date: 2016 Sep 19
Country of Publication:
United States

Citation Formats

Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Lithographic patterning. United States: N. p., 2018. Web.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, & Yager, Kevin G. Lithographic patterning. United States.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Tue . "Lithographic patterning". United States.
title = {Lithographic patterning},
author = {Black, Charles Thomas and Stein, Aaron and Wright, Gwen and Yager, Kevin G.},
abstractNote = {This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {11}


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