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Title: Lithographic patterning

Abstract

This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

Inventors:
; ; ;
Issue Date:
Research Org.:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1493607
Patent Number(s):
10,126,652
Application Number:
15/269,202
Assignee:
Brookhaven Science Associates, LLC (Upton, NY) BNL
DOE Contract Number:  
AC02-98CH10886; SC0012704
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Sep 19
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Lithographic patterning. United States: N. p., 2018. Web.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, & Yager, Kevin G. Lithographic patterning. United States.
Black, Charles Thomas, Stein, Aaron, Wright, Gwen, and Yager, Kevin G. Tue . "Lithographic patterning". United States. https://www.osti.gov/servlets/purl/1493607.
@article{osti_1493607,
title = {Lithographic patterning},
author = {Black, Charles Thomas and Stein, Aaron and Wright, Gwen and Yager, Kevin G.},
abstractNote = {This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {11}
}

Patent:

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Works referenced in this record:

Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up
journal, October 2006

  • Cheng, J.?Y.; Ross, C.?A.; Smith, H.?I.
  • Advanced Materials, Vol. 18, Issue 19, p. 2505-2521
  • DOI: 10.1002/adma.200502651