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Title: Electron beam masks for compressive sensors

Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
1490037
Assignee:
Battelle Memorial Institute (Richland, WA) CHO
Patent Number(s):
10,109,453
Application Number:
15/075,031
Contract Number:
FG02-03ER46057; AC05-76RL01830
Resource Relation:
Patent File Date: 2016 Mar 18
Research Org:
Battelle Memorial Institute, Richland, WA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION

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