Conformal optical metasurfaces

Title: Conformal optical metasurfaces

Full Record
Other Related Research

Structures for scattering light at multiple wavelengths are disclosed. Scattering elements are fabricated with different geometric dimensions and arrangements, to scatter or focus light at the the same focal distance for each wavelength, or at different focal distances according to the desired application. The scattering elements fabricated on a substrate can be peeled off with a polymer matrix and attached to a lens to modify the optical properties of the lens.

Inventors:: Kamali, Seyedeh Mahsa; Arbabi, Ehsan; Arbabi, Amir; Faraon, Andrei

Issue Date:: 2018-06-12

OSTI Identifier:: 1457713

Assignee:: California Institute of Technology (Pasadena, CA) EFRC

Patent Number(s):: 9,995,859

Application Number:: 15/097,101

Contract Number:: SC0001293

Resource Relation:: Patent File Date: 2016 Apr 12

Research Org:: California Institute of Technology, Pasadena, CA (United States)

Sponsoring Org:: USDOE

Country of Publication:: United States

Language:: English

Full Text
View Full Text

Have feedback or suggestions for a way to improve these results? !

Save / Share this Record no
Export Metadata
- Endnote
- RIS
- Excel
- CSV
- XML
Send to Email

Send to Email

Email address:

Content:

Similar Records

Similar records in DOepatents and OSTI.GOV collections:

Method and apparatus for forming conformal SiN.sub.x films

Patent Wang, Qi

A silicon nitride film formation method includes: Heating a substrate to be subjected to film formation to a substrate temperature; heating a wire to a wire temperature; supplying silane, ammonia, and hydrogen gases to the heating member; and forming a silicon nitride film on the substrate.
Full Text Available November 2007
Method of making dense, conformal, ultra-thin cap layers for nanoporous low-k ILD by plasma assisted atomic layer deposition

Patent Jiang, Ying-Bing ; Cecchi, Joseph L ; Brinker, C Jeffrey

Barrier layers and methods for forming barrier layers on a porous layer are provided. The methods can include chemically adsorbing a plurality of first molecules on a surface of the porous layer in a chamber and forming a first layer of the first molecules on the surface of the porous layer. A plasma can then be used to react a plurality of second molecules with the first layer of first molecules to form a first layer of a barrier layer. The barrier layers can seal the pores of the porous material, function as a diffusion barrier, be conformal, and/or havemore »« less
Full Text Available May 2011
Method to planarize three-dimensional structures to enable conformal electrodes

Patent Nikolic, Rebecca J ; Conway, Adam M ; Graff, Robert T ; Reinhardt, Catherine ; Voss, Lars F ; Shao, Qinghui

Methods for fabricating three-dimensional PIN structures having conformal electrodes are provided, as well as the structures themselves. The structures include a first layer and an array of pillars with cavity regions between the pillars. A first end of each pillar is in contact with the first layer. A segment is formed on the second end of each pillar. The cavity regions are filled with a fill material, which may be a functional material such as a neutron sensitive material. The fill material covers each segment. A portion of the fill material is etched back to produce an exposed portion ofmore »« less
Full Text Available November 2012
Conformal coating of highly structured surfaces

Patent Ginley, David S. ; Perkins, John ; Berry, Joseph ; Gennett, Thomas

Method of applying a conformal coating to a highly structured substrate and devices made by the disclosed methods are disclosed. An example method includes the deposition of a substantially contiguous layer of a material upon a highly structured surface within a deposition process chamber. The highly structured surface may be associated with a substrate or another layer deposited on a substrate. The method includes depositing a material having an amorphous structure on the highly structured surface at a deposition pressure of equal to or less than about 3 mTorr. The method may also include removing a portion of the amorphousmore »« less
Full Text Available December 2012
Conformal chemically resistant coatings for microflow devices

Patent Folta, James A. ; Zdeblick, Mark

A process for coating the inside surfaces of silicon microflow devices, such as electrophoresis microchannels, with a low-stress, conformal (uniform) silicon nitride film which has the ability to uniformly coat deeply-recessed cavities with, for example, aspect ratios of up to 40:1 or higher. The silicon nitride coating allows extended exposure to caustic solutions. The coating enables a microflow device fabricated in silicon to be resistant to all classes of chemicals: acids, bases, and solvents. The process involves low-pressure (vacuum) chemical vapor deposition. The ultra-low-stress silicon nitride deposition process allows 1-2 .mu.m thick films without cracks, and so enables extended chemicalmore »« less
Full Text Available May 2003