Method and apparatus for wavefront sensing

Bahk, Seung-Whan

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Title: Method and apparatus for wavefront sensing

Abstract

A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size .LAMBDA.. The method also includes directing an incident light field having a wavelength $$ \lamda $$ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields.

Inventors:: Bahk, Seung-Whan

Issue Date:: 2018-03-20

Research Org.:: RAM Photonics, LLC, San Diego, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1429393

Patent Number(s):: 9921111

Application Number:: 15/209,535

Assignee:: RAM Photonics, LLC, San Diego, CA

Patent Classifications (CPCs):: G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS

G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT

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G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G01B9/02 - Interferometers {for determining dimensional properties of, or relations between, measurement objects}

G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J2009/002 - {Wavefront phase distribution}
G01J9/02 - by interferometric methods
G01J9/0215 - {by shearing interferometric methods}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/706 - {Aberration measurement

Show less

DOE Contract Number:: FC52-08NA28302

Resource Type:: Patent

Resource Relation:: Patent File Date: 2016 Jul 13

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION

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                    Bahk, Seung-Whan. Method and apparatus for wavefront sensing.  United States: N. p., 2018. 
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                    Bahk, Seung-Whan. Method and apparatus for wavefront sensing.  United States.

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                    Bahk, Seung-Whan. Tue .  
        "Method and apparatus for wavefront sensing".  United States.  https://www.osti.gov/servlets/purl/1429393.

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@article{osti_1429393,

  title        = {Method and apparatus for wavefront sensing},

  author       = {Bahk, Seung-Whan},

  abstractNote = {A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size .LAMBDA.. The method also includes directing an incident light field having a wavelength $ \lamda $ to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2018},

  month        = {3}

}

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