Selective, electrochemical etching of a semiconductor
Abstract
Methods for facilitating fabricating semiconductor structures are provided which include: providing a multilayer structure including a semiconductor layer, the semiconductor layer including a dopant and having an increased conductivity; selectively increasing, using electrochemical processing, porosity of the semiconductor layer, at least in part, the selectively increasing porosity utilizing the increased conductivity of the semiconductor layer; and removing, at least in part, the semiconductor layer with the selectively increased porosity from the multilayer structure. By way of example, the selectively increasing porosity may include selectively, anodically oxidizing, at least in part, the semiconductor layer of the multilayer structure.
- Inventors:
- Issue Date:
- Research Org.:
- Rensselaer Polytechnic Inst., Troy, NY (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1429084
- Patent Number(s):
- 9922838
- Application Number:
- 15/116,041
- Assignee:
- Rensselaer Polytechnic Institute, Troy, NY
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AR0000304
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2015 Feb 10
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Dahal, Rajendra P., Bhat, Ishwara B., and Chow, Tat-Sing. Selective, electrochemical etching of a semiconductor. United States: N. p., 2018.
Web.
Dahal, Rajendra P., Bhat, Ishwara B., & Chow, Tat-Sing. Selective, electrochemical etching of a semiconductor. United States.
Dahal, Rajendra P., Bhat, Ishwara B., and Chow, Tat-Sing. Tue .
"Selective, electrochemical etching of a semiconductor". United States. https://www.osti.gov/servlets/purl/1429084.
@article{osti_1429084,
title = {Selective, electrochemical etching of a semiconductor},
author = {Dahal, Rajendra P. and Bhat, Ishwara B. and Chow, Tat-Sing},
abstractNote = {Methods for facilitating fabricating semiconductor structures are provided which include: providing a multilayer structure including a semiconductor layer, the semiconductor layer including a dopant and having an increased conductivity; selectively increasing, using electrochemical processing, porosity of the semiconductor layer, at least in part, the selectively increasing porosity utilizing the increased conductivity of the semiconductor layer; and removing, at least in part, the semiconductor layer with the selectively increased porosity from the multilayer structure. By way of example, the selectively increasing porosity may include selectively, anodically oxidizing, at least in part, the semiconductor layer of the multilayer structure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 20 00:00:00 EDT 2018},
month = {Tue Mar 20 00:00:00 EDT 2018}
}
Works referenced in this record:
Method of fabricating porous silicon carbide (SiC)
patent, October 1995
- Shor, Joseph; Kurtz, Anthony D.
- US Patent Document 5,454,915
Micromechanical component with different doping types so that one type is anodized into porous silicon
patent, October 2004
- Benzel, Hubert; Weber, Heribert; Artmann, Hans
- US Patent Document 6,803,637
Photoelectrochemical Undercut Etching of Semiconductor Material
patent-application, March 2003
- Hu, Evelyn L.; Stonas, Andreas R.
- US Patent Application 10/234535; 20030045120
Process for fabricating a thin film semiconductor device, thin film semiconductor device, and liquid crystal display
patent-application, March 2005
- Tayanaka, Hiroshi
- US Patent Application 10/939437; 20050059219
Method for Producing Gallium Nitride Substrates for Electronic and Optoelectronic Devices
patent-application, August 2013
- Weisbuch, Claude C. A.; Speck, James S.
- US Patent Application 13879183; 20130207237
Lateral Electrochemical Etching of III-Nitride Materials for Microfabrication
patent-application, January 2014
- Han, Jung
- US Patent Application 13/923248; 20140003458