Method and system for gas flow mitigation of molecular contamination of optics
Abstract
A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1417885
- Patent Number(s):
- 9874512
- Application Number:
- 14/466,516
- Assignee:
- National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Aug 22
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, and Scott, Sarah. Method and system for gas flow mitigation of molecular contamination of optics. United States: N. p., 2018.
Web.
Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, & Scott, Sarah. Method and system for gas flow mitigation of molecular contamination of optics. United States.
Delgado, Gildardo, Johnson, Terry, Arienti, Marco, Harb, Salam, Klebanoff, Lennie, Garcia, Rudy, Tahmassebpur, Mohammed, and Scott, Sarah. Tue .
"Method and system for gas flow mitigation of molecular contamination of optics". United States. https://www.osti.gov/servlets/purl/1417885.
@article{osti_1417885,
title = {Method and system for gas flow mitigation of molecular contamination of optics},
author = {Delgado, Gildardo and Johnson, Terry and Arienti, Marco and Harb, Salam and Klebanoff, Lennie and Garcia, Rudy and Tahmassebpur, Mohammed and Scott, Sarah},
abstractNote = {A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {1}
}