Nanocrystal thin film fabrication methods and apparatus
Abstract
Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of Pennsylvania, Philadelphia, PA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division
- OSTI Identifier:
- 1416328
- Patent Number(s):
- 9865465
- Application Number:
- 14/761,799
- Assignee:
- The Trustees Of The University Of Pennsylvania (Philadelphia, PA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- SC0002158
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Jan 17
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, and Lai, Yuming. Nanocrystal thin film fabrication methods and apparatus. United States: N. p., 2018.
Web.
Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, & Lai, Yuming. Nanocrystal thin film fabrication methods and apparatus. United States.
Kagan, Cherie R., Kim, David K., Choi, Ji-Hyuk, and Lai, Yuming. Tue .
"Nanocrystal thin film fabrication methods and apparatus". United States. https://www.osti.gov/servlets/purl/1416328.
@article{osti_1416328,
title = {Nanocrystal thin film fabrication methods and apparatus},
author = {Kagan, Cherie R. and Kim, David K. and Choi, Ji-Hyuk and Lai, Yuming},
abstractNote = {Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {1}
}