Nanocrystal thin film fabrication methods and apparatus

Title: Nanocrystal thin film fabrication methods and apparatus

Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.

Inventors:: Kagan, Cherie R.; Kim, David K.; Choi, Ji-Hyuk; Lai, Yuming

Issue Date:: 2018-01-09

OSTI Identifier:: 1416328

Assignee:: The Trustees Of The University Of Pennsylvania (Philadelphia, PA) CHO

Patent Number(s):: 9,865,465

Application Number:: 14/761,799

Contract Number:: SC0002158

Resource Relation:: Patent File Date: 2014 Jan 17

Research Org:: The Trustees Of The University Of Pennsylvania, Philadelphia, PA (United States)

Sponsoring Org:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

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Other works cited in this record:

Doped Nanocrystals
patent-application, March 2010

Cao, Y. Charles
US Patent Application 12/376371; 20100055462
URL: http://appft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PG01&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.html&r=1&f=G&l=50&s1=%2220100055462%22.PGNR.&OS=DN/20100055462&RS=DN/20100055462

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