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Title: Electroless atomic layer deposition

A method of electroless atomic layer deposition is described. The method electrolessly generates a layer of sacrificial material on a surface of a first material. The method adds doses of a solution of a second material to the substrate. The method performs a galvanic exchange reaction to oxidize away the layer of the sacrificial material and deposit a layer of the second material on the surface of the first material. The method can be repeated for a plurality of iterations in order to deposit a desired thickness of the second material on the surface of the first material.
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Issue Date:
OSTI Identifier:
National Technology & Engineering Solutions of Sandia, LLC SNL-A
Patent Number(s):
Application Number:
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Resource Relation:
Patent File Date: 2014 Feb 25
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
Country of Publication:
United States

Works referenced in this record:

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