Electroless atomic layer deposition
Abstract
A method of electroless atomic layer deposition is described. The method electrolessly generates a layer of sacrificial material on a surface of a first material. The method adds doses of a solution of a second material to the substrate. The method performs a galvanic exchange reaction to oxidize away the layer of the sacrificial material and deposit a layer of the second material on the surface of the first material. The method can be repeated for a plurality of iterations in order to deposit a desired thickness of the second material on the surface of the first material.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1406567
- Patent Number(s):
- 9803285
- Application Number:
- 14/189,866
- Assignee:
- National Technology & Engineering Solutions of Sandia, LLC
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Feb 25
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Robinson, David Bruce, Cappillino, Patrick J., Sheridan, Leah B., Stickney, John L., and Benson, David M. Electroless atomic layer deposition. United States: N. p., 2017.
Web.
Robinson, David Bruce, Cappillino, Patrick J., Sheridan, Leah B., Stickney, John L., & Benson, David M. Electroless atomic layer deposition. United States.
Robinson, David Bruce, Cappillino, Patrick J., Sheridan, Leah B., Stickney, John L., and Benson, David M. Tue .
"Electroless atomic layer deposition". United States. https://www.osti.gov/servlets/purl/1406567.
@article{osti_1406567,
title = {Electroless atomic layer deposition},
author = {Robinson, David Bruce and Cappillino, Patrick J. and Sheridan, Leah B. and Stickney, John L. and Benson, David M.},
abstractNote = {A method of electroless atomic layer deposition is described. The method electrolessly generates a layer of sacrificial material on a surface of a first material. The method adds doses of a solution of a second material to the substrate. The method performs a galvanic exchange reaction to oxidize away the layer of the sacrificial material and deposit a layer of the second material on the surface of the first material. The method can be repeated for a plurality of iterations in order to deposit a desired thickness of the second material on the surface of the first material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {10}
}
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