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Title: Non-hydrolytic metal oxide films for perovskite halide overcoating and stabilization

A method of protecting a perovskite halide film from moisture and temperature includes positioning the perovskite halide film in a chamber. The chamber is maintained at a temperature of less than 200 degrees Celsius. An organo-metal compound is inserted into the chamber. A non-hydrolytic oxygen source is subsequently inserted into the chamber. The inserting of the organo-metal compound and subsequent inserting of the non-hydrolytic oxygen source into the chamber is repeated for a predetermined number of cycles. The non-hydrolytic oxygen source and the organo-metal compound interact in the chamber to deposit a non-hydrolytic metal oxide film on perovskite halide film. The non-hydrolytic metal oxide film protects the perovskite halide film from relative humidity of greater than 35% and a temperature of greater than 150 degrees Celsius, respectively.
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Resource Relation:
Patent File Date: 2015 Aug 05
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
Country of Publication:
United States

Other works cited in this record:

Method for forming introgen-containing oxide thin film using plasma enhanced atomic layer deposition
patent-application, April 2004

Yttrium and Titanium High-K Dielectric Film
patent-application, January 2011

Improvement of the humidity stability of organic–inorganic perovskite solar cells using ultrathin Al2O3 layers prepared by atomic layer deposition
journal, January 2015
  • Dong, Xu; Fang, Xiang; Lv, Minghang
  • Journal of Materials Chemistry A, Vol. 3, Issue 10, p. 5360-5367
  • DOI: 10.1039/C4TA06128D

Carbon Nanotube/Polymer Composites as a Highly Stable Hole Collection Layer in Perovskite Solar Cells
journal, September 2014
  • Habisreutinger, Severin N.; Leijtens, Tomas; Eperon, Giles E.
  • Nano Letters, Vol. 14, Issue 10, p. 5561-5568
  • DOI: 10.1021/nl501982b

Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition
journal, April 2008
  • Rauwel, Erwan; Clavel, Guylhaine; Willinger, Marc-Georg
  • Angewandte Chemie International Edition, Vol. 47, Issue 19, p. 3592-3595
  • DOI: 10.1002/anie.200705550

Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
journal, April 2000

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