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Title: Particle and chemical control using tunnel flow

An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.
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Issue Date:
OSTI Identifier:
KLA-Tencor Corporation SNL-A
Patent Number(s):
Application Number:
Contract Number:
Resource Relation:
Patent File Date: 2013 Sep 23
Research Org:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
Country of Publication:
United States

Other works cited in this record:

Systems for protecting internal components of a EUV light source from plasma-generated debris
patent, April 2008

Extreme ultra violet light source apparatus
patent, June 2010

Radiation system with contamination barrier
patent, March 2012

Extreme ultraviolet light source apparatus
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Systems and methods for drive laser beam delivery in an EUV light source
patent, October 2012

Lithographic apparatus with debris suppression, and device manufacturing method
patent-application, September 2004

Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source
patent-application, October 2008

Method And Apparatus For Cleaning Collector Mirror In Euv Light Generator
patent-application, December 2009

Extreme Ultraviolet Light Source With A Debris-Mitigated And Cooled Collector Optics
patent-application, February 2012

Illuminance formation and color difference of mixed-color light emitting diodes in a rectangular light pipe: an analytical approach
journal, January 2008
  • Cheng, Chu-Ming; Chern, Jyh-Long
  • Applied Optics, Vol. 47, Issue 3, p. 431-441
  • DOI: 10.1364/AO.47.000431

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