Particle and chemical control using tunnel flow
Abstract
An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1389856
- Patent Number(s):
- 9759912
- Application Number:
- 14/034,273
- Assignee:
- KLA-Tencor Corporation
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2013 Sep 23
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Chilese, Frank, Delgado, Gildardo R., Wack, Daniel, and Torczynski, John R. Particle and chemical control using tunnel flow. United States: N. p., 2017.
Web.
Chilese, Frank, Delgado, Gildardo R., Wack, Daniel, & Torczynski, John R. Particle and chemical control using tunnel flow. United States.
Chilese, Frank, Delgado, Gildardo R., Wack, Daniel, and Torczynski, John R. Tue .
"Particle and chemical control using tunnel flow". United States. https://www.osti.gov/servlets/purl/1389856.
@article{osti_1389856,
title = {Particle and chemical control using tunnel flow},
author = {Chilese, Frank and Delgado, Gildardo R. and Wack, Daniel and Torczynski, John R.},
abstractNote = {An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 12 00:00:00 EDT 2017},
month = {Tue Sep 12 00:00:00 EDT 2017}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Systems for protecting internal components of a EUV light source from plasma-generated debris
patent, April 2008
- Bowering, Norbert; Hansson, Bjorn
- US Patent Document 7,365,351
Extreme ultra violet light source apparatus
patent, June 2010
- Abe, Tamotsu; Ueno, Yoshifumi; Yabu, Takayuki
- US Patent Document 7,732,794
Radiation system with contamination barrier
patent, March 2012
- Bakker, Levinus Pieter; Dierichs, Marcel Mathijs Theodore Marie; Freriks, Johannes Maria
- US Patent Document 8,129,702
Extreme ultraviolet light source apparatus
patent, April 2012
- Asayama, Takeshi; Kakizaki, Kouji; Endo, Akira
- US Patent Document 8,158,959
Systems and methods for drive laser beam delivery in an EUV light source
patent, October 2012
- Partlo, William N.; Fomenkov, Igor V.; Paxton, Jason
- US Patent Document 8,283,643
Lithographic apparatus with debris suppression, and device manufacturing method
patent-application, September 2004
- Bakker, Levinus Pieter
- US Patent Application 10/743270; 20040179182
Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source
patent-application, October 2008
- Ueno, Yoshifumi; Moriya, Masato; Nakano, Masaki
- US Patent Application 12/150077; 20080267816
Method And Apparatus For Cleaning Collector Mirror In Euv Light Generator
patent-application, December 2009
- Asayama, Takeshi; Someya, Hiroshi; Moriya, Masato
- US Patent Document 12/478083; 20090301517
Extreme Ultraviolet Light Source With A Debris-Mitigated And Cooled Collector Optics
patent-application, February 2012
- Abhari, Reza; Giovannini, Andrea; Rollinger, Bod
- US Patent Application 13/262184; 20120025109
Illuminance formation and color difference of mixed-color light emitting diodes in a rectangular light pipe: an analytical approach
journal, January 2008
- Cheng, Chu-Ming; Chern, Jyh-Long
- Applied Optics, Vol. 47, Issue 3, p. 431-441