Large-area, laterally-grown epitaxial semiconductor layers
Abstract
Structures and methods for confined lateral-guided growth of a large-area semiconductor layer on an insulating layer are described. The semiconductor layer may be formed by heteroepitaxial growth from a selective growth area in a vertically-confined, lateral-growth guiding structure. Lateral-growth guiding structures may be formed in arrays over a region of a substrate, so as to cover a majority of the substrate region with laterally-grown epitaxial semiconductor tiles. Quality regions of low-defect, stress-free GaN may be grown on silicon.
- Inventors:
- Issue Date:
- Research Org.:
- Yale Univ., New Haven, CT (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1371757
- Patent Number(s):
- 9711352
- Application Number:
- 14/776,634
- Assignee:
- Yale University
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- SC0001134
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Mar 14
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Citation Formats
Han, Jung, Song, Jie, and Chen, Danti. Large-area, laterally-grown epitaxial semiconductor layers. United States: N. p., 2017.
Web.
Han, Jung, Song, Jie, & Chen, Danti. Large-area, laterally-grown epitaxial semiconductor layers. United States.
Han, Jung, Song, Jie, and Chen, Danti. Tue .
"Large-area, laterally-grown epitaxial semiconductor layers". United States. https://www.osti.gov/servlets/purl/1371757.
@article{osti_1371757,
title = {Large-area, laterally-grown epitaxial semiconductor layers},
author = {Han, Jung and Song, Jie and Chen, Danti},
abstractNote = {Structures and methods for confined lateral-guided growth of a large-area semiconductor layer on an insulating layer are described. The semiconductor layer may be formed by heteroepitaxial growth from a selective growth area in a vertically-confined, lateral-growth guiding structure. Lateral-growth guiding structures may be formed in arrays over a region of a substrate, so as to cover a majority of the substrate region with laterally-grown epitaxial semiconductor tiles. Quality regions of low-defect, stress-free GaN may be grown on silicon.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {7}
}
Works referenced in this record:
Confined lateral selective epitaxial growth
patent, August 1990
- Schubert, Peter
- US Patent Document 4,948,456
Method for the fabrication of an alternation of layers of monocrystalline semiconducting material and layers of insulating material
patent, August 1990
- Pribat, Didier; Karapiperis, Leonidas; Collet, Christian
- US Patent Document 4,952,526
Method for the growing of heteroepitaxial layers
patent, October 1994
- Pribat, Daniel; Gerard, Bruno; Legagneux, Pierre
- US Patent Document 5,356,510
Method for manufacturing group III-V compound semiconductor crystals
patent, December 1996
- Iyechika, Yasushi; Takada, Tomoyuki
- US Patent Document 5,587,014
Methods and devices using group III nitride compound semiconductor
patent, September 2003
- Koide, Norikatsu; Kato, Hisaki
- US Patent Document 6,617,668
Method of patterning elements within a semiconductor topography
patent, June 2008
- Ramkumar, Krishnaswamy; Blosse, Alain; Hunter, James
- US Patent Document 7,390,750
Non-polar and semi-polar GaN substrates, devices, and methods for making them
patent, June 2010
- Hanser, Andrew D.; Preble, Edward A.; Liu, Lianghong
- US Patent Document 7,727,874
Method of forming a trench by a silicon-containing mask
patent, August 2012
- Lee, Hsiu-Chun; Chen, Yi-Nan; Liu, Hsien-Wen
- US Patent Document 8,252,684
Pendeoepitaxial gallium nitride semiconductor layers on silicon carbide substrates
December 2002
- Linthicum, Kevin J.; Gehrke, Thomas; Thomson, Darren B.
- US Patent Application 10/193823; 20020179911
GaN selective growth on SiC substrates by ammonia-source MBE
patent-application, December 2002
- Tang, Haipeng; Webb, James B.; Bardwell, Jennifer A.
- US Patent Application 09/882048; 20020189534
Semiconductor device and method for manufacturing
patent-application, November 2003
- Suguro, Kyoichi; Miyano, Kiyotaka; Mizushima, Ichiro
- US Patent Application 10/406281; 20030211713
Sacrificial template method of fabricating a nanotube
patent-application, September 2004
- Yang, Peidong; He, Rongrui; Goldberger, Joshua
- US Patent Application 10/731745; 20040175844
Substrate for epitaxy
patent-application, December 2004
- Dwilinski, Robert; Doradzinski, Roman; Garczynski, Jerzy
- US Patent Application 10/493747; 20040261692
Light Emitting Diode With Porous Sic Substrate And Method For Fabricating
patent-application, August 2005
- Li, Ting; Ibbetson, James; Keller, Bernd
- US Patent Application 10/676953; 20050184307
Lattice-mismatched semiconductor structures employing seed layers and related fabrication methods
patent-application, June 2006
- Cheng, Zhiyuan
- US Patent Application 11/311822; 20060131606
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
patent-application, December 2006
- Lochtefeld, Anthony J.; Currie, Matthew T.; Cheng, Zhiyuan
- US Patent Application 11/436198; 20060292719
Method of fabricating orientation-controlled single-crystalline wire and method of fabricating transistor having the same
patent-application, January 2007
- Xianyu, Wenxu; Park, Young-Soo; Noguchi, Takashi
- US Patent Application 11/483586; 20070017439
Group III nitride semiconductor stacked structure and production method thereof
patent-application, April 2007
- Sakai, Hiromitsu
- US Patent Application 11/543950; 20070080369
Multiple shadow mask structure for deposition shadow mask protection and method of making and using same
patent-application, February 2008
- Conrad, Jeffrey W.
- US Patent Application 11/900087; 20080042543
Light-Emitter-Based Devices with Lattice-Mismatched Semiconductor Structures
patent-application, April 2008
- Li, Jizhong; Lochtefeld, Anthony J.
- US Patent Application 11/875381; 20080093622
Growth of indium gallium nitride (InGaN) on porous gallium nitride (GaN) template by metal-organic chemical vapor deposition (MOCVD)
patent-application, January 2009
- Chua, Soo Jin; Hartono, Haryono; Soh, Chew Beng
- US Patent Application 11/823756; 20090001416
Epitaxial Methods And Templates Grown By The Methods
patent-application, July 2008
- Arena, Chantal; Werkhoven, Christiaan J.; Bertram, JR., Ronald Thomas
- US Patent Application 12/180418; 20090098343
Growth of Planar Non-Polar M-Plane and Semi-Polar Gallium Nitride with Hydride Vapor Phase Epitaxy (HVPE)
patent-application, January 2010
- Usikov, Alexander; Syrkin, Alexander; Brown, Robert G.W.
- US Patent Application 12/503656; 20100012948
Method of zinc oxide film grown on the epitaxial lateral overgrowth gallium nitride template
patent-application, April 2010
- Chua, Soon Jin; Zhou, Hailong; Lin, Jianyi
- US Patent Application 12/288977; 20100102307
Method For Producing Trench Isolation In Silicon Carbide And Gallium Nitride And Articles Made Thereby
patent-application, May 2010
- Waldrab, Peter Wilson; Kretchmer, James William; Galea, Jason David
- US Patent Application 11/682067; 20100117188
Integrated Circuitry And Methods Of Forming A Semiconductor-On-Insulator Substrate
patent-application, July 2010
- Wells, David H.
- US Patent Application 12/725797; 20100171176
Epitaxial Methods And Structures For Forming Semiconductor Materials
patent-application, July 2010
- Arena, Chantal
- US Patent Application 12/610092; 20100187568
Migration And Plasma Enhanced Chemical Vapor Deposition
patent-application, August 2010
- Butcher, Kenneth Scott Alexander
- US Patent Application 12/703713; 20100210067
Methods Of Solid Phase Recrystallization Of Thin Film Using Pulse Train Annealing Method
patent-application, March 2011
- Moffatt, Stephen; Hunter, Aaron Muir; Adams, Bruce E.
- US Patent Application 12/764723; 20110065264
Forming A Compound-Nitride Structure That Includes A Nucleation Layer
patent-application, October 2011
- Su, Jie
- US Patent Application 12/980060; 20110244663
Method of Group III Metal - Nitride Material Growth Using Metal Organic Vapor Phase Epitaxy
patent-application, October 2011
- Detchprohm, Theeradetch; Zhu, Mingwei; Wetzel, Christian
- US Patent Application 13/087614; 20110254134
Gan-Based Laser Diodes With Misfit Dislocations Displaced From The Active Region
patent-application, December 2011
- Bhat, Rajaram
- US Patent Application 12/789936; 20110292957
Confined Lateral Growth of Crystalline Material
patent-application, February 2012
- McComber, Kevin Andrew; Liu, Jifeng; Michel, Jurgen
- US Patent Application 13/191682; 20120025195 Kind Code
Homo-Material Heterophased Quantum Well
patent-application, February 2012
- Lo, I-Kai; Hsieh, Chia-Ho; Pang, Wen-Yuan
- US Patent Application 13/009545; 20120043528
III Nitride Semiconductor Substrate, Epitaxial Substrate, And Semiconductor Device
patent-application, May 2012
- Ishibashi, Keiji
- US Patent Application 13/347717; 20120104558
Electromechanical Transducer And Method Of Fabricating The Same
patent-application, May 2012
- Masaki, Yuichi
- US Patent Application 13/280269; 20120112603
Methods Of Manufacturing Semiconductor Devices
patent-application, May 2012
- Noh, Jin-Tae; Lim, Hun-Hyeong; Hwang, Ki-Hyun
- US Patent Application 13/287509; 20120115293
Semiconductor Structures Including Bodies Of Semiconductor Material, Devices Including Such Structures And Related Methods
patent-application, January 2013
- Tang, Sanh D.; Wells, David H.; Allen, Tuman E.
- US Patent Application 13/175507; 20130001682
Opto-Electronic And Electronic Devices Using An N-Face Or M-Plane Gallium Nitride Substrate Prepared Via Ammonothermal Growth
patent-application, January 2013
- Hashimoto, Tadao; Sato, Hitoshi; Nakamura, Shuji
- US Patent Application 13/605791; 20130015492
Methods and Systems for Optical Receivers
patent-application, November 2013
- Liboiron-Ladouceur, Odile; Sakib, Meer Nazmus
- US Patent Application 13/869145; 20130294782
Growth of GaN free from cracks on a (111)Si substrate by selective metalorganic vapor-phase epitaxy
journal, January 2002
- Honda, Y.; Kuroiwa, Y.; Yamaguchi, M.
- Applied Physics Letters, Vol. 80, Issue 2
Influence of polarity on carrier transport in semipolar (2021¯) and (202¯1) multiple-quantum-well light-emitting diodes
journal, June 2012
- Kawaguchi, Yoshinobu; Huang, Chia-Yen; Wu, Yuh-Renn
- Applied Physics Letters, Vol. 100, Issue 23
Efficiency droop in nitride-based light-emitting diodes
journal, July 2010
- Piprek, Joachim
- physica status solidi (a), Vol. 207, Issue 10, p. 2217-2225
Conformal vapor phase epitaxy
journal, December 1989
- Pribat, D.; Karapiperis, L.; Collet, C.
- Applied Physics Letters, Vol. 55, Issue 24
Defect‐free, conformally grown (100) GaAs films
journal, July 1990
- Pribat, D.; Dupuy, M.; Legagneux, P.
- Applied Physics Letters, Vol. 57, Issue 4
Confined lateral selective epitaxial growth of silicon for device fabrication
journal, May 1990
- Schubert, P. J.; Neudeck, G. W.
- IEEE Electron Device Letters, Vol. 11, Issue 5