High power RF window deposition apparatus, method, and device

Title: High power RF window deposition apparatus, method, and device

A process for forming a coating for an RF window which has improved secondary electron emission and reduced multipactor for high power RF waveguides is formed from a substrate with low loss tangent and desirable mechanical characteristics. The substrate has an RPAO deposition layer applied which oxygenates the surface of the substrate to remove carbon impurities, thereafter has an RPAN deposition layer applied to nitrogen activate the surface of the substrate, after which a TiN deposition layer is applied using Titanium tert-butoxide. The TiN deposition layer is capped with a final RPAN deposition layer of nitridation to reduce the bound oxygen in the TiN deposition layer. The resulting RF window has greatly improved titanium layer adhesion, reduced multipactor, and is able to withstand greater RF power levels than provided by the prior art.

Inventors:: Ives, Lawrence R.; Lucovsky, Gerald; Zeller, Daniel

Issue Date:: 2017-07-04

OSTI Identifier:: 1368189

Assignee:: Calabazas Creek Research, Inc. CHO

Patent Number(s):: 9,698,454

Application Number:: 13/937,216

Contract Number:: SC0004571

Resource Relation:: Patent File Date: 2013 Jul 09

Research Org:: Calabazas Creek Research, Inc. San Mateo, CA (United States)

Sponsoring Org:: USDOE

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

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Other works cited in this record:

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patent, September 1993

Sandhu, Gurtej S.; Buley, Todd W.
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Nucleation enhancement for chemical vapor deposition of diamond
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Berg, Steve W.; Goeppner, George A.; Grelick, Arthur E.
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