Underpotential deposition-mediated layer-by-layer growth of thin films
Abstract
A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.
- Inventors:
- Issue Date:
- Research Org.:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1366730
- Patent Number(s):
- 9689085
- Application Number:
- 14/689,708
- Assignee:
- Brookhaven Science Associates, LLC
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
C - CHEMISTRY C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES C25D - PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS
- DOE Contract Number:
- AC02-98CH10886
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2015 Apr 17
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Wang, Jia Xu, and Adzic, Radoslav R. Underpotential deposition-mediated layer-by-layer growth of thin films. United States: N. p., 2017.
Web.
Wang, Jia Xu, & Adzic, Radoslav R. Underpotential deposition-mediated layer-by-layer growth of thin films. United States.
Wang, Jia Xu, and Adzic, Radoslav R. Tue .
"Underpotential deposition-mediated layer-by-layer growth of thin films". United States. https://www.osti.gov/servlets/purl/1366730.
@article{osti_1366730,
title = {Underpotential deposition-mediated layer-by-layer growth of thin films},
author = {Wang, Jia Xu and Adzic, Radoslav R.},
abstractNote = {A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 27 00:00:00 EDT 2017},
month = {Tue Jun 27 00:00:00 EDT 2017}
}
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