Filters for blocking macroparticles in plasma deposition apparatus
Abstract
This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1364598
- Patent Number(s):
- 9683285
- Application Number:
- 14/218,434
- Assignee:
- The Regents of the University of California
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Mar 18
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Citation Formats
Anders, Andre, and Kolbeck, Jonathan. Filters for blocking macroparticles in plasma deposition apparatus. United States: N. p., 2017.
Web.
Anders, Andre, & Kolbeck, Jonathan. Filters for blocking macroparticles in plasma deposition apparatus. United States.
Anders, Andre, and Kolbeck, Jonathan. Tue .
"Filters for blocking macroparticles in plasma deposition apparatus". United States. https://www.osti.gov/servlets/purl/1364598.
@article{osti_1364598,
title = {Filters for blocking macroparticles in plasma deposition apparatus},
author = {Anders, Andre and Kolbeck, Jonathan},
abstractNote = {This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {6}
}
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