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Title: Sequential infiltration synthesis for enhancing multiple-patterning lithography

Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.
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Resource Relation:
Patent File Date: 2013 May 24
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
Country of Publication:
United States

Works referenced in this record:

Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
journal, April 2010
  • Kontziampasis, D.; Beltsios, K.; Tegou, E.
  • Journal of Applied Polymer Science, Vol. 117, Issue 4, p. 2189-2195
  • DOI: 10.1002/app.31644

Enhanced polymeric lithography resists via sequential infiltration synthesis
journal, July 2011
  • Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
  • Journal of Materials Chemistry, Vol. 21, Issue 32, 11722-11725
  • DOI: 10.1039/C1JM12461G

Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
journal, April 2012
  • Tseng, Yu-Chih; Mane, Anil U.; Elam, Jeffrey W.
  • Advanced Materials, Vol. 24, Issue 19, p. 2608-2613
  • DOI: 10.1002/adma.201104871

Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
journal, September 2010
  • Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
  • Advanced Materials, Vol. 22, Issue 45, p. 5129-5133
  • DOI: 10.1002/adma.201002465

A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
journal, May 2011
  • Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
  • ACS Nano, Vol. 5, Issue 6, p. 4600-4606
  • DOI: 10.1021/nn2003234

Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
journal, July 2011
  • Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
  • The Journal of Physical Chemistry C, Vol. 115, Issue 36, p. 17725-17729
  • DOI: 10.1021/jp205532e

Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self-Assembled Polymeric Templates
journal, January 2007
  • Ras, R. H. A.; Kemell, M.; de Wit, J.
  • Advanced Materials, Vol. 19, Issue 1, p. 102-106
  • DOI: 10.1002/adma.200600728

Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds
journal, December 2001
  • Lopes, Ward A.; Jaeger, Heinrich M.
  • Nature, Vol. 414, Issue 6865, p. 735-738
  • DOI: 10.1038/414735a

Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors
journal, April 2009
  • Wang, Yong; Qin, Yong; Berger, Andreas
  • Advanced Materials, Vol. 21, Issue 27, p. 2763-2766
  • DOI: 10.1002/adma.200900136