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Title: Intense X-ray and EUV light source

An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.
Inventors:
; ;
Issue Date:
OSTI Identifier:
1364402
Assignee:
Los Alamos National Security, LLC LANL
Patent Number(s):
9,686,844
Application Number:
15/088,366
Contract Number:
AC52-06NA25396
Resource Relation:
Patent File Date: 2016 Apr 01
Research Org:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY