Intense X-ray and EUV light source
Abstract
An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.
- Inventors:
- Issue Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1364402
- Patent Number(s):
- 9686844
- Application Number:
- 15/088,366
- Assignee:
- Los Alamos National Security, LLC
- Patent Classifications (CPCs):
-
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
- DOE Contract Number:
- AC52-06NA25396
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2016 Apr 01
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
Citation Formats
Coleman, Joshua, Ekdahl, Carl, and Oertel, John. Intense X-ray and EUV light source. United States: N. p., 2017.
Web.
Coleman, Joshua, Ekdahl, Carl, & Oertel, John. Intense X-ray and EUV light source. United States.
Coleman, Joshua, Ekdahl, Carl, and Oertel, John. Tue .
"Intense X-ray and EUV light source". United States. https://www.osti.gov/servlets/purl/1364402.
@article{osti_1364402,
title = {Intense X-ray and EUV light source},
author = {Coleman, Joshua and Ekdahl, Carl and Oertel, John},
abstractNote = {An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {6}
}
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