Catalyst support structure, catalyst including the structure, reactor including a catalyst, and methods of forming same
Structures, catalysts, and reactors suitable for use for a variety of applications, including gas-to-liquid and coal-to-liquid processes and methods of forming the structures, catalysts, and reactors are disclosed. The catalyst material can be deposited onto an inner wall of a microtubular reactor and/or onto porous tungsten support structures using atomic layer deposition techniques.
- Issue Date:
- OSTI Identifier:
- 1356295
- Assignee:
- The Regents of the University of Colorado, a body corporate HQPR
- Patent Number(s):
- 9,643,159
- Application Number:
- 14/436,433
- Contract Number:
- AR0000291
- Resource Relation:
- Patent File Date: 2013 Sep 26
- Research Org:
- The Regents of the University of Colorado, a body corporate, Denver, CO (United States)
- Sponsoring Org:
- USDOE
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE
Works referenced in this record:
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patent, April 1982
- Slaugh, Lynn; Hoxmeier, Ronald
- US Patent Document 4,325,843
Semiconductor catalytic layer and atomic layer deposition thereof
patent, November 2002
patent, November 2002
- Lopatin, Sergey; Galewski, Carl
- US Patent Document 6,479,902
Tungsten atomic layer deposition on polymers
journal, July 2008
journal, July 2008
- Wilson, C. A.; McCormick, J. A.; Cavanagh, A. S.
- Thin Solid Films, Vol. 516, Issue 18, p. 6175-6185