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Title: Method of making dielectric capacitors with increased dielectric breakdown strength

Abstract

The invention is directed to a process for making a dielectric ceramic film capacitor and the ceramic dielectric laminated capacitor formed therefrom, the dielectric ceramic film capacitors having increased dielectric breakdown strength. The invention increases breakdown strength by embedding a conductive oxide layer between electrode layers within the dielectric layer of the capacitors. The conductive oxide layer redistributes and dissipates charge, thus mitigating charge concentration and micro fractures formed within the dielectric by electric fields.

Inventors:
; ;
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1356201
Patent Number(s):
9646766
Application Number:
13/523,335
Assignee:
UChicago Argonne, LLC
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01G - CAPACITORS
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2012 Jun 14
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Ma, Beihai, Balachandran, Uthamalingam, and Liu, Shanshan. Method of making dielectric capacitors with increased dielectric breakdown strength. United States: N. p., 2017. Web.
Ma, Beihai, Balachandran, Uthamalingam, & Liu, Shanshan. Method of making dielectric capacitors with increased dielectric breakdown strength. United States.
Ma, Beihai, Balachandran, Uthamalingam, and Liu, Shanshan. Tue . "Method of making dielectric capacitors with increased dielectric breakdown strength". United States. https://www.osti.gov/servlets/purl/1356201.
@article{osti_1356201,
title = {Method of making dielectric capacitors with increased dielectric breakdown strength},
author = {Ma, Beihai and Balachandran, Uthamalingam and Liu, Shanshan},
abstractNote = {The invention is directed to a process for making a dielectric ceramic film capacitor and the ceramic dielectric laminated capacitor formed therefrom, the dielectric ceramic film capacitors having increased dielectric breakdown strength. The invention increases breakdown strength by embedding a conductive oxide layer between electrode layers within the dielectric layer of the capacitors. The conductive oxide layer redistributes and dissipates charge, thus mitigating charge concentration and micro fractures formed within the dielectric by electric fields.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue May 09 00:00:00 EDT 2017},
month = {Tue May 09 00:00:00 EDT 2017}
}

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