Title: High-gain thompson-scattering X-ray free-electron laser by time-synchronic laterally tilted optical wave

Abstract

An improved optical undulator for use in connection with free electron radiation sources is provided. A tilt is introduced between phase fronts of an optical pulse and the pulse front. Two such pulses in a counter-propagating geometry overlap to create a standing wave pattern. A line focus is used to increase the intensity of this standing wave pattern. An electron beam is aligned with the line focus. The relative angle between pulse front and phase fronts is adjusted such that there is a velocity match between the electron beam and the overlapping optical pulses along the line focus. This allows one to provide a long interaction length using short and intense optical pulses, thereby greatly increasing the radiation output from the electron beam as it passes through this optical undulator.

Inventors:

Chang, Chao; Tang, Chuanxiang; Wu, Juhao

Issue Date:

2017-05-09

Research Org.:

SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1356183

Patent Number(s):

9648713

Application Number:

14/775,838

Assignee:

The Board of Trustees of the Leland Stanford Junior University

Patent Classifications (CPCs):

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE

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H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT

H01S3/005 - {Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
H01S3/0903 - {Free-electron laser}
H01S3/30 - using scattering effects, e.g. stimulated Brillouin or Raman effects
H01S4/00 - Devices using stimulated emission of electromagnetic radiation in wave ranges other than those covered by groups H01S1/00, H01S3/00 or H01S5/00, e.g. phonon masers, X-ray lasers or gamma-ray lasers

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE

H05G2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

H05H2007/041 - {for beam bunching, e.g. undulators}

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DOE Contract Number:  

AC02-76SF00515

Resource Type:

Patent

Resource Relation:

Patent File Date: 2014 Mar 14

Country of Publication:

United States

Language:

English

Subject:

36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION