Title: Nanopatterned articles produced using reconstructed block copolymer films

Abstract

Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.

Inventors:

Russell, Thomas P.; Park, Soojin; Wang;, Jia-Yu; Kim, Bokyung

Issue Date:

2017-05-02

Research Org.:

THE UNIVERSITY OF MASSACHUSETTS, Boston, MA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1354817

Patent Number(s):

9636887

Application Number:

15/138,343

Assignee:

THE UNIVERSITY OF MASSACHUSETTS

Patent Classifications (CPCs):

B - PERFORMING OPERATIONS B32 - LAYERED PRODUCTS B32B - LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM

B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS

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B - PERFORMING OPERATIONS B32 - LAYERED PRODUCTS B32B - LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM

B32B2264/105 - Metal particles
B32B3/10 - characterised by a discontinuous layer, i.e. formed of separate pieces of material
B32B5/16 - characterised by features of a layer formed of particles, e.g. chips, powder {, granules

B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS

B81C1/00031 - {Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
B81C2201/0149 - Forming nanoscale microstructures using auto-arranging or self-assembling material

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

B82Y30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

Y10T428/12049 - Nonmetal component
Y10T428/24355 - Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

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DOE Contract Number:  

FG02-96ER45612

Resource Type:

Patent

Resource Relation:

Patent File Date: 2016 Apr 26

Country of Publication:

United States

Language:

English

Subject:

36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY