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Title: Electronic interconnects and devices with topological surface states and methods for fabricating same

Abstract

An interconnect is disclosed with enhanced immunity of electrical conductivity to defects. The interconnect includes a material with charge carriers having topological surface states. Also disclosed is a method for fabricating such interconnects. Also disclosed is an integrated circuit including such interconnects. Also disclosed is a gated electronic device including a material with charge carriers having topological surface states.

Inventors:
; ;
Issue Date:
Research Org.:
Princeton Univ., NJ (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1349670
Patent Number(s):
9613905
Application Number:
14/919,008
Assignee:
THE TRUSTEES OF PRINCETON UNIVERSITY
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
C - CHEMISTRY C22 - METALLURGY C22C - ALLOYS
DOE Contract Number:  
FG02-07ER46419
Resource Type:
Patent
Resource Relation:
Patent File Date: 2015 Oct 21
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION

Citation Formats

Yazdani, Ali, Ong, N. Phuan, and Cava, Robert J. Electronic interconnects and devices with topological surface states and methods for fabricating same. United States: N. p., 2017. Web.
Yazdani, Ali, Ong, N. Phuan, & Cava, Robert J. Electronic interconnects and devices with topological surface states and methods for fabricating same. United States.
Yazdani, Ali, Ong, N. Phuan, and Cava, Robert J. Tue . "Electronic interconnects and devices with topological surface states and methods for fabricating same". United States. https://www.osti.gov/servlets/purl/1349670.
@article{osti_1349670,
title = {Electronic interconnects and devices with topological surface states and methods for fabricating same},
author = {Yazdani, Ali and Ong, N. Phuan and Cava, Robert J.},
abstractNote = {An interconnect is disclosed with enhanced immunity of electrical conductivity to defects. The interconnect includes a material with charge carriers having topological surface states. Also disclosed is a method for fabricating such interconnects. Also disclosed is an integrated circuit including such interconnects. Also disclosed is a gated electronic device including a material with charge carriers having topological surface states.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {4}
}

Patent:

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