Atomic layer deposition of metal sulfide thin films using non-halogenated precursors
Abstract
A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N,N'-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H.sub.2S) to prepare a Cu.sub.2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.
- Inventors:
- Issue Date:
- Research Org.:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1347438
- Patent Number(s):
- 9040113
- Application Number:
- 12/780,664
- Assignee:
- UChicago Argonne, LLC (Chicago, IL)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- AC02-06CH11357
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2010 May 14
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Martinson, Alex B. F., Elam, Jeffrey W., and Pellin, Michael J. Atomic layer deposition of metal sulfide thin films using non-halogenated precursors. United States: N. p., 2015.
Web.
Martinson, Alex B. F., Elam, Jeffrey W., & Pellin, Michael J. Atomic layer deposition of metal sulfide thin films using non-halogenated precursors. United States.
Martinson, Alex B. F., Elam, Jeffrey W., and Pellin, Michael J. Tue .
"Atomic layer deposition of metal sulfide thin films using non-halogenated precursors". United States. https://www.osti.gov/servlets/purl/1347438.
@article{osti_1347438,
title = {Atomic layer deposition of metal sulfide thin films using non-halogenated precursors},
author = {Martinson, Alex B. F. and Elam, Jeffrey W. and Pellin, Michael J.},
abstractNote = {A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N,N'-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H.sub.2S) to prepare a Cu.sub.2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {5}
}
Works referenced in this record:
Atomic layer deposition of Cu2S for future application in photovoltaics
journal, March 2009
- Martinson, Alex B. F.; Elam, Jeffrey W.; Pellin, Michael J.
- Applied Physics Letters, Vol. 94, Issue 12
Growth of conductive copper sulfide thin films by atomic layer deposition
journal, February 2002
- Johansson, Johanna; Kostamo, Juhana; Karppinen, Maarit
- Journal of Materials Chemistry, Vol. 12, Issue 4
Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
journal, January 2006
- Li, Zhengwen; Rahtu, Antti; Gordon, Roy G.
- Journal of The Electrochemical Society, Vol. 153, Issue 11
CuInS2–TiO2 heterojunctions solar cells obtained by atomic layer deposition
journal, May 2003
- Nanu, Marian; Reijnen, Liesbeth; Meester, Ben
- Thin Solid Films, Vol. 431-432, p. 492-496
Comparison of Cu x S Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition
journal, May 2005
- Reijnen, Liesbeth; Meester, Ben; de Lange, Frits
- Chemistry of Materials, Vol. 17, Issue 10
Copper(I) tert -Butylthiolato Clusters as Single-Source Precursors for High-Quality Chalcocite Thin Films: Film Growth and Microstructure Control
journal, May 2007
- Schneider, Sven; Ireland, John R.; Hersam, Mark C.
- Chemistry of Materials, Vol. 19, Issue 11
Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal
journal, March 2005
- Li, Zhengwen; Barry, Seán T.; Gordon, Roy G.
- Inorganic Chemistry, Vol. 44, Issue 6