Infrared control coating of thin film devices
Abstract
Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than 200.degree. C.
- Inventors:
- Issue Date:
- Research Org.:
- ITN ENERGY SYSTEMS, INC., Littleton, CO (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1345221
- Patent Number(s):
- 9581741
- Application Number:
- 14/293,934
- Assignee:
- ITN ENERGY SYSTEMS, INC.
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- EE0006348
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Jun 02
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Berland, Brian Spencer, Stowell, Jr., Michael Wayne, and Hollingsworth, Russell. Infrared control coating of thin film devices. United States: N. p., 2017.
Web.
Berland, Brian Spencer, Stowell, Jr., Michael Wayne, & Hollingsworth, Russell. Infrared control coating of thin film devices. United States.
Berland, Brian Spencer, Stowell, Jr., Michael Wayne, and Hollingsworth, Russell. Tue .
"Infrared control coating of thin film devices". United States. https://www.osti.gov/servlets/purl/1345221.
@article{osti_1345221,
title = {Infrared control coating of thin film devices},
author = {Berland, Brian Spencer and Stowell, Jr., Michael Wayne and Hollingsworth, Russell},
abstractNote = {Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than 200.degree. C.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {2}
}
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