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Title: Infrared control coating of thin film devices

Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than C.
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Resource Relation:
Patent File Date: 2014 Jun 02
Research Org:
ITN ENERGY SYSTEMS, INC., Littleton, CO (United States)
Sponsoring Org:
Country of Publication:
United States

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