Mask alignment system for semiconductor processing
Abstract
A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
- Inventors:
- Issue Date:
- Research Org.:
- Varian Semiconductor Equipment Associates, Inc. Gloucester, MA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1343746
- Patent Number(s):
- 9570309
- Application Number:
- 14/101,974
- Assignee:
- Varian Semiconductor Equipment Associates, Inc.
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- EE0004737
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2013 Dec 10
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Webb, Aaron P., Carlson, Charles T., Weaver, William T., and Grant, Christopher N. Mask alignment system for semiconductor processing. United States: N. p., 2017.
Web.
Webb, Aaron P., Carlson, Charles T., Weaver, William T., & Grant, Christopher N. Mask alignment system for semiconductor processing. United States.
Webb, Aaron P., Carlson, Charles T., Weaver, William T., and Grant, Christopher N. Tue .
"Mask alignment system for semiconductor processing". United States. https://www.osti.gov/servlets/purl/1343746.
@article{osti_1343746,
title = {Mask alignment system for semiconductor processing},
author = {Webb, Aaron P. and Carlson, Charles T. and Weaver, William T. and Grant, Christopher N.},
abstractNote = {A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 14 00:00:00 EST 2017},
month = {Tue Feb 14 00:00:00 EST 2017}
}
Works referenced in this record:
Means for supporting a mask
patent, December 1999
- Kawahashi, Takashi; Kai, Hiromi
- US Patent Document 6,003,828
Integrated mask and method and apparatus for manufacturing organic EL device using the same
patent, July 2008
- Fujimori, Shigeo; Kitamura, Yoshiyuki; Kanamori, Hiromitsu
- US Patent Document 7,396,558