Method and tool to reverse the charges in anti-reflection films used for solar cell applications
Abstract
A method is provided for making a solar cell. The method includes providing a stack including a substrate, a barrier layer disposed on the substrate, and an anti-reflective layer disposed on the barrier layer, where the anti-reflective layer has charge centers. The method also includes generating a corona with a charging tool and contacting the anti-reflective layer with the corona thereby injecting charge into at least some of the charge centers in the anti-reflective layer. Ultra-violet illumination and temperature-based annealing may be used to modify the charge of the anti-reflective layer.
- Inventors:
- Issue Date:
- Research Org.:
- Arizona Board of Regents on Behalf of Arizona State University, Scottsdale, AZ (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1341853
- Patent Number(s):
- 9,559,222
- Application Number:
- 14/456,477
- Assignee:
- Arizona Board of Regents on Behalf of Arizona State University (Scottsdale, AZ)
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Aug 11
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY; 36 MATERIALS SCIENCE
Citation Formats
Sharma, Vivek, and Tracy, Clarence. Method and tool to reverse the charges in anti-reflection films used for solar cell applications. United States: N. p., 2017.
Web.
Sharma, Vivek, & Tracy, Clarence. Method and tool to reverse the charges in anti-reflection films used for solar cell applications. United States.
Sharma, Vivek, and Tracy, Clarence. Tue .
"Method and tool to reverse the charges in anti-reflection films used for solar cell applications". United States. https://www.osti.gov/servlets/purl/1341853.
@article{osti_1341853,
title = {Method and tool to reverse the charges in anti-reflection films used for solar cell applications},
author = {Sharma, Vivek and Tracy, Clarence},
abstractNote = {A method is provided for making a solar cell. The method includes providing a stack including a substrate, a barrier layer disposed on the substrate, and an anti-reflective layer disposed on the barrier layer, where the anti-reflective layer has charge centers. The method also includes generating a corona with a charging tool and contacting the anti-reflective layer with the corona thereby injecting charge into at least some of the charge centers in the anti-reflective layer. Ultra-violet illumination and temperature-based annealing may be used to modify the charge of the anti-reflective layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {1}
}
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Works referenced in this record:
Silicon nitride passivation for a solar cell
patent, August 2011
- Zhou, Lisong; Dixit, Sangeeta; Choi, Soo Young
- US Patent Document 7,993,700
Experimental evidence of parasitic shunting in silicon nitride rear surface passivated solar cells
journal, January 2002
- Dauwe, Stefan; Mittelstädt, Lutz; Metz, Axel
- Progress in Photovoltaics: Research and Applications, Vol. 10, Issue 4, p. 271-278