High resolution projection micro stereolithography system and method
Abstract
A high-resolution P.mu.SL system and method incorporating one or more of the following features with a standard P.mu.SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P.mu.SL system to fabricate microstructures of different materials.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1332282
- Patent Number(s):
- 9492969
- Application Number:
- 13/149,773
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011 May 31
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, and Lee, Howon. High resolution projection micro stereolithography system and method. United States: N. p., 2016.
Web.
Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, & Lee, Howon. High resolution projection micro stereolithography system and method. United States.
Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, and Lee, Howon. Tue .
"High resolution projection micro stereolithography system and method". United States. https://www.osti.gov/servlets/purl/1332282.
@article{osti_1332282,
title = {High resolution projection micro stereolithography system and method},
author = {Spadaccini, Christopher M. and Farquar, George and Weisgraber, Todd and Gemberling, Steven and Fang, Nicholas and Xu, Jun and Alonso, Matthew and Lee, Howon},
abstractNote = {A high-resolution P.mu.SL system and method incorporating one or more of the following features with a standard P.mu.SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P.mu.SL system to fabricate microstructures of different materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 15 00:00:00 EST 2016},
month = {Tue Nov 15 00:00:00 EST 2016}
}
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Works referenced in this record:
Optical device and optical machining system using the optical device
patent, December 1996
- Amako, Jun; Miura, Hirotsuna; Sonehara, Tomio
- US Patent Document 5,589,955
Low thermal stress birefringence imaging lens
patent, February 2014
- Kurtz, Andrew F.; Bietry, Joseph; Silverstein, Barry D.
- US Patent Document 8,649,094