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Title: High resolution projection micro stereolithography system and method

Abstract

A high-resolution P.mu.SL system and method incorporating one or more of the following features with a standard P.mu.SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P.mu.SL system to fabricate microstructures of different materials.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1332282
Patent Number(s):
9,492,969
Application Number:
13/149,773
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA) LLNL
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011 May 31
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, and Lee, Howon. High resolution projection micro stereolithography system and method. United States: N. p., 2016. Web.
Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, & Lee, Howon. High resolution projection micro stereolithography system and method. United States.
Spadaccini, Christopher M., Farquar, George, Weisgraber, Todd, Gemberling, Steven, Fang, Nicholas, Xu, Jun, Alonso, Matthew, and Lee, Howon. Tue . "High resolution projection micro stereolithography system and method". United States. https://www.osti.gov/servlets/purl/1332282.
@article{osti_1332282,
title = {High resolution projection micro stereolithography system and method},
author = {Spadaccini, Christopher M. and Farquar, George and Weisgraber, Todd and Gemberling, Steven and Fang, Nicholas and Xu, Jun and Alonso, Matthew and Lee, Howon},
abstractNote = {A high-resolution P.mu.SL system and method incorporating one or more of the following features with a standard P.mu.SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P.mu.SL system to fabricate microstructures of different materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {11}
}

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