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Title: Method and apparatus for sputtering with a plasma lens

A plasma lens for enhancing the quality and rate of sputter deposition onto a substrate is described herein. The plasma lens serves to focus positively charged ions onto the substrate while deflecting negatively charged ions, while at the same time due to the line of sight positioning of the lens, allowing for free passage of neutrals from the target to the substrate. The lens itself is formed of a wound coil of multiple turns, inside of which are deposed spaced lens electrodes which are electrically paired to impress an E field overtop the B field generated by the coil, the potential applied to the electrodes increasing from end to end towards the center of the lens, where the applied voltage is set to a high potential at the center electrodes as to produce a potential minimum on the axis of the lens.
Issue Date:
OSTI Identifier:
The Regents of the University of California (Oakland, CA) LBNL
Patent Number(s):
Application Number:
Contract Number:
Resource Relation:
Patent File Date: 2012 Oct 05
Research Org:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org:
Country of Publication:
United States

Works referenced in this record:

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journal, July 2009
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