Multi-channel gas-delivery system
Abstract
One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.
- Inventors:
- Issue Date:
- Research Org.:
- SolarCity Corporation, San Mateo, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1324687
- Patent Number(s):
- 9441295
- Application Number:
- 12/952,127
- Assignee:
- SolarCity Corporation (San Mateo, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
- DOE Contract Number:
- EE0000589
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2010 Nov 22
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 14 SOLAR ENERGY
Citation Formats
Rozenzon, Yan, Trujillo, Robert T., and Beese, Steven C. Multi-channel gas-delivery system. United States: N. p., 2016.
Web.
Rozenzon, Yan, Trujillo, Robert T., & Beese, Steven C. Multi-channel gas-delivery system. United States.
Rozenzon, Yan, Trujillo, Robert T., and Beese, Steven C. Tue .
"Multi-channel gas-delivery system". United States. https://www.osti.gov/servlets/purl/1324687.
@article{osti_1324687,
title = {Multi-channel gas-delivery system},
author = {Rozenzon, Yan and Trujillo, Robert T. and Beese, Steven C.},
abstractNote = {One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 13 00:00:00 EDT 2016},
month = {Tue Sep 13 00:00:00 EDT 2016}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Process for manufacturing a vapor phase epitaxial wafer of compound semiconductor without causing breaking of wafer by utilizing a pre-coating of carbonaceous powder
patent, September 1979
- Hasegawa, Shinichi; Fujita, Hisanori
- US Patent Document 4,168,998
Seal assembly and method for providing a seal in a rotary kiln
patent, March 1980
- Leon, F.
- US Patent Document 4,193,756
High capacity sputter-etching apparatus
patent, May 1981
- Lepselter, Martin P.
- US Patent Document 4,268,374
High capacity etching apparatus and method
patent, November 1981
- Maydan, Dan
- US Patent Document 4,298,443
Susceptor assembly
patent, January 1985
- Kusmierz, Marvin A.; Pijaszek, Robert F.
- US Patent Document 4,496,828
Reactor and susceptor for chemical vapor deposition process
patent, June 1985
- Garbis, Dennis; Chan, Joseph; Granata, Amedeo J.
- US Patent Document 4,522,149
Semiconductor fabricating apparatus
patent, December 1985
- Nishizawa, Jun-ichi; Ohmi, Tadahiro
- US Patent Document 4,558,660
Method and apparatus for deposition of tungsten silicides
patent, January 1986
- Brors, Daniel L.; Fair, James A.; Monnig, Kenneth A.
- US Patent Document 4,565,157
Induction heated reactor system for chemical vapor deposition
patent, April 1986
- Martin, John G.; Benzing, Walter C.; Graham, Robert
- US Patent Document 4,579,080
Apparatus and process for the fabrication of large area thin film multilayers
patent, September 1986
- Jansen, Frank
- US Patent Document 4,612,207
Method to inhibit autodoping in epitaxial layers from heavily doped substrates in CVD processing
patent, April 1987
- Looney, Gary W.; Robinson, Paul H.
- US Patent Document 4,661,199
Method and apparatus for producing a constant flow, constant pressure chemical vapor deposition
patent, May 1988
- Posa, John G.
- US Patent Document 4,747,367
Apparatus for depositing material on a substrate
patent, August 1988
- Conger, Darrell R.; Posa, John G.; Wickenden, Dennis K.
- US Patent Document 4,761,269
Apparatus for in-situ chamber cleaning
patent, November 1988
- Benzing, David W.
- US Patent Document 4,786,352
Rotary barrel type induction vapor-phase growing apparatus
patent, December 1988
- Sekiya, Isao
- US Patent Document 4,794,220
Reactor for heating semiconductor substrates
patent, February 1989
- Sandys, Norman
- US Patent Document 4,807,562
Barrel structure for semiconductor epitaxial reactor
patent, April 1989
- Post, Robert C.; Bordelon, Kevin N.; Moon, Burl M.
- US Patent Document 4,823,736
Gas treatment apparatus and method
patent, June 1989
- Schumaker, Norman E.; Stall, Richard A.; Nelson, Craig R.
- US Patent Document 4,838,983
Chemical vapor deposition reactor
patent, June 1989
- Gale, Ronald P.; Fan, John C. C.
- US Patent Document 4,839,145
Film forming apparatus
patent, August 1989
- Ohmura, Masanori; Sakama, Hiroshi; Araki, Kenji
- US Patent Document 4,858,558
Reactant gas injection for IC processing
patent, May 1990
- Carlson, David K.; Lindstrom, Paul R.
- US Patent Document 4,928,626
Epitaxial facility
patent, August 1991
- Dan, Jean-Pierre; De Boni, Eros; Frey, Peter
- US Patent Document 5,038,711
Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby
patent, October 1991
- Moore, Gary M.
- US Patent Document 5,053,247
Diamond synthesizing apparatus
patent, December 1991
- Ota, Nobuhiro; Fujimori, Naoji
- US Patent Document 5,074,245
Apparatus for eliminating residual nitrogen contamination in epitaxial layers of silicon carbide and resulting product
patent, June 1992
- Kong, Hua-Shuang; Coleman, Thomas G.; Carter, Jr., Calvin H.
- US Patent Document 5,119,540
Refractory susceptors for epitaxial deposition apparatus
patent, June 1992
- Severns, David W.; Lindstrom, Paul R.
- US Patent Document 5,121,531
Vapor deposition apparatus
patent, September 1992
- Ohmine, Toshimitsu; Akagawa, Keiichi; Ishihata, Akira
- US Patent Document 5,151,133
Variable rate distribution gas flow reaction chamber
patent, December 1993
- Anderson, Roger N.; Lindstrom, Paul R.; Johnson, Wayne L.
- US Patent Document 5,269,847
Silicon epitaxial reactor and control method
patent, February 1994
- Burt, Curtis Lee; Steele, John W.
- US Patent Document 5,288,364
Device for holding disk-shaped substrates in the vacuum chamber of a coating or etching apparatus
patent, September 1994
- Mahler, Peter
- US Patent Document 5,350,455
Particulate-free epitaxial process
patent, December 1994
- Logar, Roger E.
- US Patent Document 5,373,806
Robotically loaded epitaxial deposition apparatus
patent, December 1994
- Severns, David W.; Tompson, Brian; Lindstrom, Paul R.
- US Patent Document 5,374,159
CVD apparatus
patent, June 1995
- Inushima, Takashi; Hayashi, Shigenori; Takayama, Toru
- US Patent Document 5,427,824
Cylindrical apparatus for growth of epitaxial layers
patent, August 1995
- Ohta, Yutaka; Hoshina, Yusho; Arai, Takeshi
- US Patent Document 5,441,571
Programmable multizone gas injector for single-wafer semiconductor processing equipment
patent, September 1995
- Moslehi, Mehrdad M.; Davis, Cecil J.; Matthews, Robert T.
- US Patent Document 5,453,124
Gas injectors for reaction chambers in CVD systems
patent, October 1995
- Hawkins, Mark R.; Robinson, McDonald
- US Patent Document 5,458,918
Robotically loaded epitaxial deposition apparatus
patent, December 1995
- Severns, David W.; Tompson, Brian; Lindstrom, Paul R.
- US Patent Document 5,476,359
Surface treating apparatus, surface treating method and semiconductor device manufacturing method
patent, April 1996
- Ono, Tetsuo; Hiraoka, Susumu; Saito, Sakae
- US Patent Document 5,505,778
Plasma treatment method in electronic device manufacture
patent, July 1996
- Goodyear, Andrew L.; French, Ian
- US Patent Document 5,532,190
Method for heat-treating a semiconductor body
patent, March 1997
- Yamaga, Shigeki; Kimura, Chikao
- US Patent Document 5,614,447
Method for forming a multi-layer planarization structure
patent, May 1997
- Inushima, Takashi; Hayashi, Shigenori; Takayama, Toru
- US Patent Document 5,629,245
Molten metal supply device
patent, December 1997
- Usui, Hirotake; Matsuura, Kazuya; Nitta, Shin
- US Patent Document 5,700,422
Chemical vapor deposition
patent, February 1999
- Crawley, John A.; Saywell, Victor
- US Patent Document 5,871,586
Gas inlets for wafer processing chamber
patent, June 1999
- Anderson, Roger N.; Hey, Peter; Carlson, David K.
- US Patent Document 5,916,369
Reactant gas ejector head
patent, September 1999
- Fukunaga, Yukio; Shinozaki, Hiroyuki; Tsukamoto, Kiwamu
- US Patent Document 5,950,925
Exhaust insert for barrel-type epitaxial reactors
patent, October 1999
- Dietze, Gerald R.; Anderson Mitchell, Dena Carol
- US Patent Document 5,964,948
Apparatus and process for growing silicon epitaxial layer
patent, November 1999
- Hamilton, Todd
- US Patent Document 5,993,555
Semiconductor processing furnace heating control system
patent, November 1999
- Bethune, Edwin M.; Olmsted, Donald
- US Patent Document 5,994,675
CVD apparatus
patent, January 2000
- Inushima, Takashi; Hayashi, Shigenori; Takayama, Toru
- US Patent Document 6,013,338
Rapid thermal processing barrel reactor for processing substrates
patent, August 2000
- Moore, Gary M.
- US Patent Document 6,110,289
Gas injection system for CVD reactors
patent, September 2000
- MacLeish, Joseph H.; Mailho, Robert D.; Sanganeria, Mahesh K.
- US Patent Document 6,113,984
Apparatus and method for sealing a vacuum chamber
patent, February 2001
- Chang, Hao-Wei; Fang, Jen Shang; Hung, Ching-Kun
- US Patent Document 6,193,804
Horizontal reactor for compound semiconductor growth
patent, April 2001
- Shin, Hyun K.
- US Patent Document 6,214,116
Susceptor designs for silicon carbide thin films
patent, April 2001
- Kong, Hua-Shuang; Carter, Jr., Calvin H.; Sumakeris, Joseph
- US Patent Document 6,217,662
Epitaxial growth furnace
patent, July 2001
- Imai, Masato; Mayusumi, Masanori; Nakahara, Shinji
- US Patent Document 6,262,393
In-situ post epitaxial treatment process
patent, January 2002
- Dietze, Gerald R.
- US Patent Document 6,338,756
Method for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity
patent, February 2002
- Ide, Shigeaki
- US Patent Document 6,348,397
Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates
patent, June 2002
- Riley, Norma; Anderson, Roger N.; Imper, Grant D.
- US Patent Document 6,399,510
Showerhead apparatus for radical-assisted deposition
patent, August 2002
- Kim, Jae-Ho; Shin, Inshik; Park, Sang-Joon
- US Patent Document 6,435,428
Heat treatment method and heat treatment apparatus
patent, October 2002
- Nishitani, Eisuke; Kasanami, Katsuhisa; Matsuyama, Naoko
- US Patent Document 6,472,639
Gas dispersion head
patent, November 2002
- Moore, Gary M.; Nishikawa, Katsuhito
- US Patent Document 6,475,284
Gas inlets for wafer processing chamber
patent, December 2002
- Anderson, Roger N.; Hey, Peter; Carlson, David K.
- US Patent Document 6,500,734
Method and apparatus for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity
patent, January 2003
- Ide, Shigeaki
- US Patent Document 6,506,256
Susceptor designs for silicon carbide thin films
patent, March 2003
- Kong, Hua-Shuang; Carter, Jr., Calvin H.; Sumakeris, Joseph
- US Patent Document 6,530,990
Chemical vapor deposition system for polycrystalline silicon rod production
patent, April 2003
- Keck, David W.; Russell, Ronald O.; Dawson, Howard J.
- US Patent Document 6,544,333
In-situ post epitaxial treatment process
patent, May 2003
- Dietze, Gerald R.; Kononchuk, Oleg
- US Patent Document 6,562,128
System for performing thermal reflow operations under high gravity conditions
patent, June 2004
- Robinson, Karl M.; Chapek, David L.
- US Patent Document 6,747,249
Semiconductor wafer and vapor phase growth apparatus
patent, November 2004
- Ose, Hiroki
- US Patent Document 6,814,811
Temperature controlled window with a fluid supply system
patent, July 2005
- Rozenzon, Yan; Lavi, Gilad; Lee, Evans
- US Patent Document 6,916,399
Ceramic multilayer capacitor array
patent, August 2005
- Hsieh, Yuan-Chung; Tsai, Men-Tsuan; Luh, Shiow-Chang
- US Patent Document 6,934,145
Susceptor with epitaxial growth control devices and epitaxial reactor using the same
patent, December 2006
- Preti, Franco; Yarlagadda, Srinivas
- US Patent Document 7,153,368
Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
patent, January 2007
- Wickramanayaka, Sunil; Ishihara, Masahito; Nozaki, Yoshikazu
- US Patent Document 7,159,537
Tunable gas distribution plate assembly
patent, September 2007
- Blonigan, Wendell T.; White, John M.; Bagley, William
- US Patent Document 7,270,713
Thin-film deposition apparatus
patent, September 2007
- Shinriki, Hiroshi; Arami, Junichi
- US Patent Document 7,273,526
Reaction chamber for an epitaxial reactor
patent, January 2008
- Preti, Franco; Ogliari, Vincenzo; Tarenzi, Giuseppe
- US Patent Document 7,314,526
Method for forming thin film and apparatus for forming thin film
patent, April 2008
- Shinriki, Hiroshi; Matsumoto, Kenji; Tatsumi, Toru
- US Patent Document 7,354,622
Modified susceptor for barrel reactor
patent, December 2008
- Hellwig, Lance G.
- US Patent Document 7,462,246
Heated gas box for PECVD applications
patent, December 2009
- Sen, Soovo; Shmurun, Inna; Nowak, Thomas
- US Patent Document 7,628,863
High temperature ALD inlet manifold
patent, April 2011
- Provencher, Timothy J.; Hickson, Craig B.
- US Patent Document 7,918,938
Showerhead electrode assembly for plasma processing apparatuses
patent, December 2011
- Kennedy, William S.; Jacob, David
- US Patent Document 8,080,107
Film forming apparatus and method, gas supply device and storage medium
patent, March 2012
- Kakegawa, Takashi
- US Patent Document 8,133,323
Methods for fabricating group III nitride structures with a cluster tool
patent, May 2012
- Nijhawan, Sandeep; Burrows, Brian H.; Ishikawa, Tetsuya
- US Patent Document 8,183,132
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
patent, July 2012
- Bera, Kallol; Zhao, Xiaoye; Doan, Kenny L.
- US Patent Document 8,231,799
Method and apparatus for reducing particle contamination in a deposition system
patent, September 2012
- Suzuki, Kenji; Gomi, Atsushi; Hara, Masamichi
- US Patent Document 8,268,078
Single heterojunction back contact solar cell
patent, October 2012
- Lee, Jong-Jan; Schuele, Paul J.; Droes, Steven R.
- US Patent Document 8,288,645
Epitaxial barrel susceptor having improved thickness uniformity
patent, March 2013
- Hellwig, Lance G.; Kommu, Srikanth; Pitney, John A.
- US Patent Document 8,404,049
Gas supply device, substrate processing apparatus and substrate processing method
patent, April 2013
- Masuda, Noriiki
- US Patent Document 8,430,962
Film forming apparatus, film forming method and storage medium
patent, September 2013
- Takagi, Toshio
- US Patent Document 8,539,908
Stable wafer-carrier system
patent, October 2013
- Rozenzon, Yan; Trujillo, Robert T.; Beese, Steven C.
- US Patent Document 8,562,745
Shower head gas injection apparatus with secondary high pressure pulsed gas injection
patent, November 2014
- Strang, Eric J.
- US Patent Document 8,877,000
Device and process for chemical vapor phase treatment
patent, March 2015
- Borean, Christophe; Delcarri, Jean-Luc
- US Patent Document 8,967,081
Liner assembly for chemical vapor deposition chamber
patent, March 2015
- Carlson, David K.; Samir, Mehmet Tugrul; Myo, Nyi O.
- US Patent Document 8,980,005
Inject insert liner assemblies for chemical vapor deposition systems and methods of using same
patent, August 2015
- Abedijaberi, Arash; Pitney, John A.; Thomas, Shawn George
- US Patent Document 9,117,670
Solar cell efficiency tables (Version 45): Solar cell efficiency tables
journal, December 2014
- Green, Martin A.; Emery, Keith; Hishikawa, Yoshihiro
- Progress in Photovoltaics: Research and Applications, Vol. 23, Issue 1