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Title: Ion implantation system and process for ultrasensitive determination of target isotopes

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.
Inventors:
;
Issue Date:
OSTI Identifier:
1324641
Assignee:
BATTELLE MEMORIAL INSTITUTE (Richland, WA) PNNL
Patent Number(s):
9,443,708
Application Number:
14/482,332
Contract Number:
AC05-76RL01830
Resource Relation:
Patent File Date: 2014 Sep 10
Research Org:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES; 47 OTHER INSTRUMENTATION

Other works cited in this record:

Investigation of Cu-, Zn- and Fe-containing human brain proteins using isotopic-enriched tracers by LA-ICP-MS and MALDI-FT-ICR-MS
journal, April 2005
  • Becker, J. Susanne; Zoriy, Miroslav; Pickhardt, Carola
  • International Journal of Mass Spectrometry, Vol. 242, Issue 2-3, p. 135-144
  • DOI: 10.1016/j.ijms.2004.10.027

The production of ultra-high purity single isotopes or tailored isotope mixtures by ICP-MS
journal, January 2015
  • Liezers, M.; Farmer, O. T.; Dion, M. P.
  • International Journal of Mass Spectrometry, Vol. 376, p. 58-64
  • DOI: 10.1016/j.ijms.2014.11.004

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