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Title: Ion implantation system and process for ultrasensitive determination of target isotopes

Abstract

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.

Inventors:
;
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1324641
Patent Number(s):
9443708
Application Number:
14/482,332
Assignee:
BATTELLE MEMORIAL INSTITUTE (Richland, WA)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
AC05-76RL01830
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Sep 10
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES; 47 OTHER INSTRUMENTATION

Citation Formats

Farmer, III, Orville T., and Liezers, Martin. Ion implantation system and process for ultrasensitive determination of target isotopes. United States: N. p., 2016. Web.
Farmer, III, Orville T., & Liezers, Martin. Ion implantation system and process for ultrasensitive determination of target isotopes. United States.
Farmer, III, Orville T., and Liezers, Martin. Tue . "Ion implantation system and process for ultrasensitive determination of target isotopes". United States. https://www.osti.gov/servlets/purl/1324641.
@article{osti_1324641,
title = {Ion implantation system and process for ultrasensitive determination of target isotopes},
author = {Farmer, III, Orville T. and Liezers, Martin},
abstractNote = {A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {9}
}

Works referenced in this record:

Ion implantation apparatus
patent, May 1998


Ion implanter in-situ mass spectrometer
patent, December 2003


Mass spectrometric quantification of chemical mixture components
patent, December 2004


Ion beam apparatus and method employing magnetic scanning
patent, December 2010


Ion beam apparatus and method for ion implantation
patent, February 2012


Improving alpha spectrometry energy resolution by ion implantation with ICP-MS
journal, September 2014


Investigation of Cu-, Zn- and Fe-containing human brain proteins using isotopic-enriched tracers by LA-ICP-MS and MALDI-FT-ICR-MS
journal, April 2005


The production of ultra-high purity single isotopes or tailored isotope mixtures by ICP-MS
journal, January 2015