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Title: Ion implantation system and process for ultrasensitive determination of target isotopes

Abstract

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.

Inventors:
;
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1324641
Patent Number(s):
9,443,708
Application Number:
14/482,332
Assignee:
BATTELLE MEMORIAL INSTITUTE (Richland, WA)
DOE Contract Number:  
AC05-76RL01830
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Sep 10
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES; 47 OTHER INSTRUMENTATION

Citation Formats

Farmer, III, Orville T., and Liezers, Martin. Ion implantation system and process for ultrasensitive determination of target isotopes. United States: N. p., 2016. Web.
Farmer, III, Orville T., & Liezers, Martin. Ion implantation system and process for ultrasensitive determination of target isotopes. United States.
Farmer, III, Orville T., and Liezers, Martin. Tue . "Ion implantation system and process for ultrasensitive determination of target isotopes". United States. https://www.osti.gov/servlets/purl/1324641.
@article{osti_1324641,
title = {Ion implantation system and process for ultrasensitive determination of target isotopes},
author = {Farmer, III, Orville T. and Liezers, Martin},
abstractNote = {A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {9}
}

Patent:

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Works referenced in this record:

Improving alpha spectrometry energy resolution by ion implantation with ICP-MS
journal, September 2014

  • Dion, M. P.; Liezers, Martin; Farmer, Orville T.
  • Journal of Radioanalytical and Nuclear Chemistry, Vol. 303, Issue 1
  • DOI: 10.1007/s10967-014-3500-8

Investigation of Cu-, Zn- and Fe-containing human brain proteins using isotopic-enriched tracers by LA-ICP-MS and MALDI-FT-ICR-MS
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  • DOI: 10.1016/j.ijms.2004.10.027

The production of ultra-high purity single isotopes or tailored isotope mixtures by ICP-MS
journal, January 2015

  • Liezers, M.; Farmer, O. T.; Dion, M. P.
  • International Journal of Mass Spectrometry, Vol. 376, p. 58-64
  • DOI: 10.1016/j.ijms.2014.11.004

Isotope dilution mass spectrometry — A primary method of measurement and its role for RM certification
journal, September 2010