Methods and apparatus for use with extreme ultraviolet light having contamination protection
Abstract
An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1261608
- Patent Number(s):
- 9389180
- Application Number:
- 14/176,587
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Feb 10
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Chilese, Francis C., Torczynski, John R., Garcia, Rudy, Klebanoff, Leonard E., Delgado, Gildardo R., Rader, Daniel J., Geller, Anthony S., and Gallis, Michail A. Methods and apparatus for use with extreme ultraviolet light having contamination protection. United States: N. p., 2016.
Web.
Chilese, Francis C., Torczynski, John R., Garcia, Rudy, Klebanoff, Leonard E., Delgado, Gildardo R., Rader, Daniel J., Geller, Anthony S., & Gallis, Michail A. Methods and apparatus for use with extreme ultraviolet light having contamination protection. United States.
Chilese, Francis C., Torczynski, John R., Garcia, Rudy, Klebanoff, Leonard E., Delgado, Gildardo R., Rader, Daniel J., Geller, Anthony S., and Gallis, Michail A. Tue .
"Methods and apparatus for use with extreme ultraviolet light having contamination protection". United States. https://www.osti.gov/servlets/purl/1261608.
@article{osti_1261608,
title = {Methods and apparatus for use with extreme ultraviolet light having contamination protection},
author = {Chilese, Francis C. and Torczynski, John R. and Garcia, Rudy and Klebanoff, Leonard E. and Delgado, Gildardo R. and Rader, Daniel J. and Geller, Anthony S. and Gallis, Michail A.},
abstractNote = {An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {7}
}
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Works referenced in this record:
Nanoparticle Knudsen layers in gas-filled microscale geometries
journal, March 2008
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