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Title: Stabilizing laser energy density on a target during pulsed laser deposition of thin films

Abstract

A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

Inventors:
;
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1255208
Patent Number(s):
9353435
Application Number:
14/042,167
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC52-06NA25396
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Sep 30
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

Citation Formats

Dowden, Paul C., and Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States: N. p., 2016. Web.
Dowden, Paul C., & Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States.
Dowden, Paul C., and Jia, Quanxi. Tue . "Stabilizing laser energy density on a target during pulsed laser deposition of thin films". United States. https://www.osti.gov/servlets/purl/1255208.
@article{osti_1255208,
title = {Stabilizing laser energy density on a target during pulsed laser deposition of thin films},
author = {Dowden, Paul C. and Jia, Quanxi},
abstractNote = {A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {5}
}

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Works referenced in this record:

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Pulsed laser ablation and deposition of thin films
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Recent advances in pulsed-laser deposition of complex oxides
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Effects of beam parameters on excimer laser deposition of YBa 2 Cu 3 O 7−δ
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Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications
conference, June 2000


A review of ultrashort pulsed laser ablation of materials
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