skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Stabilizing laser energy density on a target during pulsed laser deposition of thin films

Abstract

A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

Inventors:
;
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1255208
Patent Number(s):
9,353,435
Application Number:
14/042,167
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
DOE Contract Number:  
AC52-06NA25396
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Sep 30
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

Citation Formats

Dowden, Paul C., and Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States: N. p., 2016. Web.
Dowden, Paul C., & Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States.
Dowden, Paul C., and Jia, Quanxi. Tue . "Stabilizing laser energy density on a target during pulsed laser deposition of thin films". United States. https://www.osti.gov/servlets/purl/1255208.
@article{osti_1255208,
title = {Stabilizing laser energy density on a target during pulsed laser deposition of thin films},
author = {Dowden, Paul C. and Jia, Quanxi},
abstractNote = {A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {5}
}

Patent:

Save / Share:

Works referenced in this record:

Oxide superconductor and magnetic metal thin film deposition by pulsed laser ablation: a review
journal, August 1994


Pulsed laser ablation and deposition of thin films
journal, January 2004

  • Ashfold, Michael N. R.; Claeyssens, Frederik; Fuge, Gareth M.
  • Chemical Society Reviews, Vol. 33, Issue 1
  • DOI: 10.1039/B207644F

Recent advances in pulsed-laser deposition of complex oxides
journal, June 2008


Preparation of Y‐Ba‐Cu oxide superconductor thin films using pulsed laser evaporation from high Tc bulk material
journal, August 1987

  • Dijkkamp, D.; Venkatesan, T.; Wu, X. D.
  • Applied Physics Letters, Vol. 51, Issue 8, p. 619-621
  • DOI: 10.1063/1.98366

Large‐area pulsed laser deposition: Techniques and applications
journal, May 1995

  • Greer, J. A.; Tabat, M. D.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 3
  • DOI: 10.1116/1.579857

Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition
journal, August 1996


Effects of beam parameters on excimer laser deposition of YBa 2 Cu 3 O 7−δ
journal, February 1990

  • Muenchausen, R. E.; Hubbard, K. M.; Foltyn, S.
  • Applied Physics Letters, Vol. 56, Issue 6
  • DOI: 10.1063/1.103303

Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications
conference, June 2000

  • Norton, David P.; Park, Chan; Lee, Y. E.
  • Symposium on High-Power Lasers and Applications, SPIE Proceedings
  • DOI: 10.1117/12.387548

A review of ultrashort pulsed laser ablation of materials
journal, February 1998

  • Shirk, M. D.; Molian, P. A.
  • Journal of Laser Applications, Vol. 10, Issue 1
  • DOI: 10.2351/1.521827