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Title: Stabilizing laser energy density on a target during pulsed laser deposition of thin films

Abstract

A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

Inventors:
;
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1255208
Patent Number(s):
9353435
Application Number:
14/042,167
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC52-06NA25396
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Sep 30
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

Citation Formats

Dowden, Paul C., and Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States: N. p., 2016. Web.
Dowden, Paul C., & Jia, Quanxi. Stabilizing laser energy density on a target during pulsed laser deposition of thin films. United States.
Dowden, Paul C., and Jia, Quanxi. Tue . "Stabilizing laser energy density on a target during pulsed laser deposition of thin films". United States. https://www.osti.gov/servlets/purl/1255208.
@article{osti_1255208,
title = {Stabilizing laser energy density on a target during pulsed laser deposition of thin films},
author = {Dowden, Paul C. and Jia, Quanxi},
abstractNote = {A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {5}
}

Works referenced in this record:

Oxide superconductor and magnetic metal thin film deposition by pulsed laser ablation: a review
journal, August 1994


Recent advances in pulsed-laser deposition of complex oxides
journal, June 2008


Preparation of Y‐Ba‐Cu oxide superconductor thin films using pulsed laser evaporation from high Tc bulk material
journal, August 1987


Large‐area pulsed laser deposition: Techniques and applications
journal, May 1995


Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition
journal, August 1996


Effects of beam parameters on excimer laser deposition of YBa 2 Cu 3 O 7−δ
journal, February 1990


Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications
conference, June 2000


A review of ultrashort pulsed laser ablation of materials
journal, February 1998