Targets and processes for fabricating same

Title: Targets and processes for fabricating same

Abstract

In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.

Inventors:: Adams, Jesse D; Malekos, Steven; Le Galloudec, Nathalie; Korgan, Grant; Cowan, Thomas; Sentoku, Yasuhiko

Issue Date:: 2016-05-17

Research Org.:: Board of Regents of the Nevada System of Higher Education, on behalf of the University of Nevada, Reno, NV (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1253289

Patent Number(s):: 9345119

Application Number:: 13/839,973

Assignee:: Board of Regents of the Nevada System of Higher Education, on behalf of the University of Nevada, Reno (Reno, NV)

Patent Classifications (CPCs):: Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

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Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/1241 - Nonplanar uniform thickness or nonlinear uniform diameter [e.g., L-shape]

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/02 - Arrangements for confining plasma by electric or magnetic fields

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/12868 - Group IB metal-base component alternative to platinum group metal-base component [e.g., precious metal, etc.]

G - PHYSICS G21 - NUCLEAR PHYSICS G21B - FUSION REACTORS
G21B1/19 - Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/24 - Generating plasma {

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Y02E30/10 - Fusion reactors

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
H05G2/008 - {involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/13 - Hollow or container type article [e.g., tube, vase, etc.]
Y10T428/12493 - Composite
Y10T428/12299 - Workpiece mimicking finished stock having nonrectangular or noncircular cross section
Y10T428/12 - All metal or with adjacent metals
Y10T428/12889 - Au-base component

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
H05G2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
H05G2/001 - {X-ray radiation generated from plasma

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/12806 - Refractory [Group IVB, VB, or VIB] metal-base component

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DOE Contract Number:: FC52-01NV14050

Resource Type:: Patent

Resource Relation:: Patent File Date: 2013 Mar 15

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 36 MATERIALS SCIENCE

Citation Formats


                    Adams, Jesse D, Malekos, Steven, Le Galloudec, Nathalie, Korgan, Grant, Cowan, Thomas, and Sentoku, Yasuhiko. Targets and processes for fabricating same.  United States: N. p., 2016. 
        Web.

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                    Adams, Jesse D, Malekos, Steven, Le Galloudec, Nathalie, Korgan, Grant, Cowan, Thomas, & Sentoku, Yasuhiko. Targets and processes for fabricating same.  United States.

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                    Adams, Jesse D, Malekos, Steven, Le Galloudec, Nathalie, Korgan, Grant, Cowan, Thomas, and Sentoku, Yasuhiko. Tue .  
        "Targets and processes for fabricating same".  United States.  https://www.osti.gov/servlets/purl/1253289.

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@article{osti_1253289,

  title        = {Targets and processes for fabricating same},

  author       = {Adams, Jesse D and Malekos, Steven and Le Galloudec, Nathalie and Korgan, Grant and Cowan, Thomas and Sentoku, Yasuhiko},

  abstractNote = {In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2016},

  month        = {5}

}

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Works referenced in this record:

High-energy Kα radiography using high-intensity, short-pulse lasers
journal, May 2006

Park, H. -S.; Chambers, D. M.; Chung, H. -K.
Physics of Plasmas, Vol. 13, Issue 5
https://doi.org/10.1063/1.2178775

Laser light and hot electron micro focusing using a conical target
journal, June 2004

Sentoku, Y.; Mima, K.; Ruhl, H.
Physics of Plasmas, Vol. 11, Issue 6, p. 3083-3087
https://doi.org/10.1063/1.1735734

Microfabricated silicon solid immersion lens
journal, January 2001

Fletcher, D. A.; Crozier, K. B.; Guarini, K. W.
Journal of Microelectromechanical Systems, Vol. 10, Issue 3
https://doi.org/10.1109/84.946806

Optimization of cone target geometry for fast ignition
journal, October 2007

Nakamura, Tatsufumi; Sakagami, Hitoshi; Johzaki, Tomoyuki
Physics of Plasmas, Vol. 14, Issue 10, Article No. 103105
https://doi.org/10.1063/1.2789561

Focusing and spectral enhancement of a repetition-rated, laser-driven, divergent multi-MeV proton beam using permanent quadrupole magnets
journal, February 2009

Nishiuchi, M.; Daito, I.; Ikegami, M.
Applied Physics Letters, Vol. 94, Issue 6
https://doi.org/10.1063/1.3078291

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Similar Records

Title: Targets and processes for fabricating same

Abstract

Citation Formats

High-energy Kα radiography using high-intensity, short-pulse lasers journal, May 2006

Laser light and hot electron micro focusing using a conical target journal, June 2004

Microfabricated silicon solid immersion lens journal, January 2001

Optimization of cone target geometry for fast ignition journal, October 2007

Focusing and spectral enhancement of a repetition-rated, laser-driven, divergent multi-MeV proton beam using permanent quadrupole magnets journal, February 2009

High-energy Kα radiography using high-intensity, short-pulse lasers
journal, May 2006

Laser light and hot electron micro focusing using a conical target
journal, June 2004

Microfabricated silicon solid immersion lens
journal, January 2001

Optimization of cone target geometry for fast ignition
journal, October 2007

Focusing and spectral enhancement of a repetition-rated, laser-driven, divergent multi-MeV proton beam using permanent quadrupole magnets
journal, February 2009