Self-assembly of block copolymers on topographically patterned polymeric substrates
Abstract
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
- Inventors:
- Issue Date:
- Research Org.:
- THE UNIVERSITY OF MASSACHUSETTS, Boston, MA (United States) THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1252417
- Patent Number(s):
- 9335629
- Application Number:
- 13/546,378
- Assignee:
- THE UNIVERSITY OF MASSACHUSETTS (Boston, MA) THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- FG02-96ER45612
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2012 Jul 11
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Russell, Thomas P., Park, Soojin, Lee, Dong Hyun, and Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States: N. p., 2016.
Web.
Russell, Thomas P., Park, Soojin, Lee, Dong Hyun, & Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States.
Russell, Thomas P., Park, Soojin, Lee, Dong Hyun, and Xu, Ting. Tue .
"Self-assembly of block copolymers on topographically patterned polymeric substrates". United States. https://www.osti.gov/servlets/purl/1252417.
@article{osti_1252417,
title = {Self-assembly of block copolymers on topographically patterned polymeric substrates},
author = {Russell, Thomas P. and Park, Soojin and Lee, Dong Hyun and Xu, Ting},
abstractNote = {Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {5}
}
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