Multiple complementary gas distribution assemblies
Abstract
In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.
- Inventors:
- Issue Date:
- Research Org.:
- Applied Materials, Inc., Santa Clara, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1245459
- Patent Number(s):
- 9303318
- Application Number:
- 13/649,488
- Assignee:
- Applied Materials, Inc. (Santa Clara, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- DOE Contract Number:
- EE0003331
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2012 Oct 11
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Ng, Tuoh-Bin, Melnik, Yuriy, Pang, Lily L, Tuncel, Eda, Nguyen, Son T, and Chen, Lu. Multiple complementary gas distribution assemblies. United States: N. p., 2016.
Web.
Ng, Tuoh-Bin, Melnik, Yuriy, Pang, Lily L, Tuncel, Eda, Nguyen, Son T, & Chen, Lu. Multiple complementary gas distribution assemblies. United States.
Ng, Tuoh-Bin, Melnik, Yuriy, Pang, Lily L, Tuncel, Eda, Nguyen, Son T, and Chen, Lu. Tue .
"Multiple complementary gas distribution assemblies". United States. https://www.osti.gov/servlets/purl/1245459.
@article{osti_1245459,
title = {Multiple complementary gas distribution assemblies},
author = {Ng, Tuoh-Bin and Melnik, Yuriy and Pang, Lily L and Tuncel, Eda and Nguyen, Son T and Chen, Lu},
abstractNote = {In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 05 00:00:00 EDT 2016},
month = {Tue Apr 05 00:00:00 EDT 2016}
}
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