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Title: Method for applying a diffusion barrier interlayer for high temperature components

A coated substrate and a method of forming a diffusion barrier coating system between a substrate and a MCrAl coating, including a diffusion barrier coating deposited onto at least a portion of a substrate surface, wherein the diffusion barrier coating comprises a nitride, oxide or carbide of one or more transition metals and/or metalloids and a MCrAl coating, wherein M includes a transition metal or a metalloid, deposited on at least a portion of the diffusion barrier coating, wherein the diffusion barrier coating restricts the inward diffusion of aluminum of the MCrAl coating into the substrate.
Inventors:
;
Issue Date:
OSTI Identifier:
1241321
Assignee:
SOUTHWEST RESEARCH INSTITUTE (San Antonio, TX) NETL
Patent Number(s):
9,279,187
Application Number:
12/616,599
Contract Number:
FC26-07NT43096
Resource Relation:
Patent File Date: 2009 Nov 11
Research Org:
SOUTHWEST RESEARCH INSTITUTE, San Antonio, TX (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Other works cited in this record:

Oxidation behaviour of sputter-depositedNi–Cr–Al micro-crystalline coatings
journal, March 1998

A comparative study of the diffusion barrier properties of TiN and ZrN
journal, December 1986

High temperature stability of Zr–Si–N diffusion barrier in Cu/Si contact system
journal, January 2004
  • Wang, Ying; Zhu, Changchun; Song, Zhongxiao
  • Microelectronic Engineering, Vol. 71, Issue 1, p. 69-75
  • DOI: 10.1016/j.mee.2003.09.002

Plasma enhanced magnetron sputter deposition of Ti–Si–C–N based nanocomposite coatings
journal, December 2008

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