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Title: Silicon-based visible and near-infrared optoelectric devices

In one aspect, the present invention provides a silicon photodetector having a surface layer that is doped with sulfur inclusions with an average concentration in a range of about 0.5 atom percent to about 1.5 atom percent. The surface layer forms a diode junction with an underlying portion of the substrate. A plurality of electrical contacts allow application of a reverse bias voltage to the junction in order to facilitate generation of an electrical signal, e.g., a photocurrent, in response to irradiation of the surface layer. The photodetector exhibits a responsivity greater than about 1 A/W for incident wavelengths in a range of about 250 nm to about 1050 nm, and a responsivity greater than about 0.1 A/W for longer wavelengths, e.g., up to about 3.5 microns.
Inventors:
;
Issue Date:
OSTI Identifier:
1240625
Assignee:
President And Fellows Of Harvard College (Cambridge, MA) GFO
Patent Number(s):
9,276,143
Application Number:
14/100,954
Contract Number:
FC36-01GO11051
Resource Relation:
Patent File Date: 2013 Dec 09
Research Org:
President And Fellows Of Harvard College, Cambridge, MA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 36 MATERIALS SCIENCE

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