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Title: Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures

Abstract

Quantum-size-controlled photoelectrochemical (QSC-PEC) etching provides a new route to the precision fabrication of epitaxial semiconductor nanostructures in the sub-10-nm size regime. For example, quantum dots (QDs) can be QSC-PEC-etched from epitaxial InGaN thin films using narrowband laser photoexcitation, and the QD sizes (and hence bandgaps and photoluminescence wavelengths) are determined by the photoexcitation wavelength.

Inventors:
; ; ; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1240427
Patent Number(s):
9276382
Application Number:
14/624,074
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82B - NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2015 Feb 17
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Fischer, Arthur J., Tsao, Jeffrey Y., Wierer, Jr., Jonathan J., Xiao, Xiaoyin, and Wang, George T. Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures. United States: N. p., 2016. Web.
Fischer, Arthur J., Tsao, Jeffrey Y., Wierer, Jr., Jonathan J., Xiao, Xiaoyin, & Wang, George T. Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures. United States.
Fischer, Arthur J., Tsao, Jeffrey Y., Wierer, Jr., Jonathan J., Xiao, Xiaoyin, and Wang, George T. Tue . "Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures". United States. https://www.osti.gov/servlets/purl/1240427.
@article{osti_1240427,
title = {Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures},
author = {Fischer, Arthur J. and Tsao, Jeffrey Y. and Wierer, Jr., Jonathan J. and Xiao, Xiaoyin and Wang, George T.},
abstractNote = {Quantum-size-controlled photoelectrochemical (QSC-PEC) etching provides a new route to the precision fabrication of epitaxial semiconductor nanostructures in the sub-10-nm size regime. For example, quantum dots (QDs) can be QSC-PEC-etched from epitaxial InGaN thin films using narrowband laser photoexcitation, and the QD sizes (and hence bandgaps and photoluminescence wavelengths) are determined by the photoexcitation wavelength.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 01 00:00:00 EST 2016},
month = {Tue Mar 01 00:00:00 EST 2016}
}

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