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Title: Hybrid polymer networks as ultra low `k` dielectric layers

According to one embodiment, a polymeric material includes at least one polydimethylsiloxane (PDMS) polymer, and at least one polyhedral oligomericsilsequioxane (POSS) molecule. According to another embodiment, a method includes providing at least one polydimethylsiloxane (PDMS) polymer, providing at least one polyhedral oligomericsilsequioxane (POSS) molecule, and coupling the at least one PDSM polymer to the at least one POSS molecule to form a hybrid polymeric material.
Inventors:
;
Issue Date:
OSTI Identifier:
1240413
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA) LLNL
Patent Number(s):
9,260,571
Application Number:
13/898,397
Contract Number:
AC52-07NA27344
Resource Relation:
Patent File Date: 2013 May 20
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Works referenced in this record:

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