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Title: Hybrid polymer networks as ultra low `k` dielectric layers


According to one embodiment, a polymeric material includes at least one polydimethylsiloxane (PDMS) polymer, and at least one polyhedral oligomericsilsequioxane (POSS) molecule. According to another embodiment, a method includes providing at least one polydimethylsiloxane (PDMS) polymer, providing at least one polyhedral oligomericsilsequioxane (POSS) molecule, and coupling the at least one PDSM polymer to the at least one POSS molecule to form a hybrid polymeric material.

Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
OSTI Identifier:
Patent Number(s):
Application Number:
Lawrence Livermore National Security, LLC (Livermore, CA)
DOE Contract Number:  
Resource Type:
Resource Relation:
Patent File Date: 2013 May 20
Country of Publication:
United States

Citation Formats

Lewicki, James, and Worsley, Marcus A. Hybrid polymer networks as ultra low `k` dielectric layers. United States: N. p., 2016. Web.
Lewicki, James, & Worsley, Marcus A. Hybrid polymer networks as ultra low `k` dielectric layers. United States.
Lewicki, James, and Worsley, Marcus A. Tue . "Hybrid polymer networks as ultra low `k` dielectric layers". United States.
title = {Hybrid polymer networks as ultra low `k` dielectric layers},
author = {Lewicki, James and Worsley, Marcus A.},
abstractNote = {According to one embodiment, a polymeric material includes at least one polydimethylsiloxane (PDMS) polymer, and at least one polyhedral oligomericsilsequioxane (POSS) molecule. According to another embodiment, a method includes providing at least one polydimethylsiloxane (PDMS) polymer, providing at least one polyhedral oligomericsilsequioxane (POSS) molecule, and coupling the at least one PDSM polymer to the at least one POSS molecule to form a hybrid polymeric material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2016},
month = {2}


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