Device and method for creating Gaussian aberration-corrected electron beams

Title: Device and method for creating Gaussian aberration-corrected electron beams

Electron beam phase gratings have phase profiles that produce a diffracted beam having a Gaussian or other selected intensity profile. Phase profiles can also be selected to correct or compensate electron lens aberrations. Typically, a low diffraction order produces a suitable phase profile, and other orders are discarded.

Inventors:: McMorran, Benjamin; Linck, Martin

Issue Date:: 2016-01-19

OSTI Identifier:: 1236003

Assignee:: University of Oregon LBNL

Patent Number(s):: 9,240,255

Application Number:: 14/199,947

Contract Number:: AC02-05CH11231

Resource Relation:: Patent File Date: 2014 Mar 06

Research Org:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org:: USDOE

Country of Publication:: United States

Language:: English

Subject:: 43 PARTICLE ACCELERATORS; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

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Other works cited in this record:

Grain size determination in nano-scale polycrystalline aggregates by precession illumination-hollow cone dark field imaging in the transmission electron microscope
journal, January 2012

Kulovits, A. K.; Facco, G.; Wiezorek, J. M. K.
Materials Characterization, Vol. 63, p. 17-26
DOI: 10.1016/j.matchar.2011.10.003

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