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Title: Patterning by area selective oxidation

Abstract

Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.

Inventors:
; ; ;
Issue Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1234237
Patent Number(s):
9,221,957
Application Number:
14/576,479
Assignee:
Brookhaven Science Associates, LLC
DOE Contract Number:  
AC02-98CH10886
Resource Type:
Patent
Resource Relation:
Patent File Date: 2015 Dec 29
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE

Citation Formats

Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., and Grubbs, Robert. Patterning by area selective oxidation. United States: N. p., 2015. Web.
Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., & Grubbs, Robert. Patterning by area selective oxidation. United States.
Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., and Grubbs, Robert. Tue . "Patterning by area selective oxidation". United States. https://www.osti.gov/servlets/purl/1234237.
@article{osti_1234237,
title = {Patterning by area selective oxidation},
author = {Nam, Chang-Yong and Kamcev, Jovan and Black, Charles T. and Grubbs, Robert},
abstractNote = {Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {12}
}

Patent:

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