Patterning by area selective oxidation
Abstract
Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.
- Inventors:
- Issue Date:
- Research Org.:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1234237
- Patent Number(s):
- 9221957
- Application Number:
- 14/576,479
- Assignee:
- Brookhaven Science Associates, LLC
- Patent Classifications (CPCs):
-
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08J - WORKING-UP
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC02-98CH10886
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2015 Dec 29
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE
Citation Formats
Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., and Grubbs, Robert. Patterning by area selective oxidation. United States: N. p., 2015.
Web.
Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., & Grubbs, Robert. Patterning by area selective oxidation. United States.
Nam, Chang-Yong, Kamcev, Jovan, Black, Charles T., and Grubbs, Robert. Tue .
"Patterning by area selective oxidation". United States. https://www.osti.gov/servlets/purl/1234237.
@article{osti_1234237,
title = {Patterning by area selective oxidation},
author = {Nam, Chang-Yong and Kamcev, Jovan and Black, Charles T. and Grubbs, Robert},
abstractNote = {Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {12}
}