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Title: Method of measuring luminescence of a material

A method of measuring luminescence of a material is disclosed. The method includes applying a light source to excite an exposed material. The method also includes amplifying an emission signal of the material. The method further includes measuring a luminescent emission at a fixed time window of about 10 picoseconds to about 10 nanoseconds. The luminescence may be radio photoluminescence (RPL) or optically stimulated luminescence (OSL).
Inventors:
Issue Date:
OSTI Identifier:
1229734
Assignee:
BATTELLE MEMORIAL INSTITUTE PNNL
Patent Number(s):
9,213,106
Application Number:
13/449,607
Contract Number:
AC05-76RL01830
Resource Relation:
Patent File Date: 2012 Apr 08
Research Org:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Other works cited in this record:

Dose response and post-irradiation characteristics of the Sunna 535-nm photo-fluorescent film dosimeter
journal, December 2003

Sunna 535-nm photo-fluorescent film dosimeter response to different environmental conditions
journal, December 2003
  • Murphy, M. K.; Kovács, A.; McLaughlin, W. L.
  • Radiation Physics and Chemistry, Vol. 68, Issue 6, p. 995-1003
  • DOI: 10.1016/S0969-806X(03)00443-2

Optimising the separation of quartz and feldspar optically stimulated luminescence using pulsed excitation
journal, August 2010

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