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Title: Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation

Abstract

An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

Inventors:
; ; ; ; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1223119
Patent Number(s):
9156068
Application Number:
14/482,510
Assignee:
KLA-Tencor Corporation (Milpitas, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Sep 10
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY

Citation Formats

Klebanoff, Leonard E., Delgado, Gildardo R., Hollenshead, Jeromy T., Umstadter, Karl R., Starodub, Elena, and Zhuang, Guorong V. Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation. United States: N. p., 2015. Web.
Klebanoff, Leonard E., Delgado, Gildardo R., Hollenshead, Jeromy T., Umstadter, Karl R., Starodub, Elena, & Zhuang, Guorong V. Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation. United States.
Klebanoff, Leonard E., Delgado, Gildardo R., Hollenshead, Jeromy T., Umstadter, Karl R., Starodub, Elena, and Zhuang, Guorong V. Tue . "Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation". United States. https://www.osti.gov/servlets/purl/1223119.
@article{osti_1223119,
title = {Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation},
author = {Klebanoff, Leonard E. and Delgado, Gildardo R. and Hollenshead, Jeromy T. and Umstadter, Karl R. and Starodub, Elena and Zhuang, Guorong V.},
abstractNote = {An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 13 00:00:00 EDT 2015},
month = {Tue Oct 13 00:00:00 EDT 2015}
}

Works referenced in this record:

Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
patent, June 2007


Radical cleaning arrangement for a lithographic apparatus
patent, December 2008


Lithographic apparatus and cleaning method therefor
patent, July 2010


Method of cleaning optical surfaces of an irradiation unit in a two-step process
patent, December 2011


Systems and methods for optics cleaning in an EUV light source
patent, January 2014


Measurement and modeling of molecular ion concentrations in a hydrogen reflex-arc discharge
journal, October 2002


Reactions of Gaseous Molecule Ions with Gaseous Molecules. V. Theory
journal, August 1958


System integration and performance of the EUV engineering test stand
conference, August 2001

  • Tichenor, Daniel A.; Ray-Chaudhuri, Avijit K.; Replogle, William C.
  • 26th Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.436665