Title: Silicon nanocrystal inks, films, and methods

Abstract

Silicon nanocrystal inks and films, and methods of making and using silicon nanocrystal inks and films, are disclosed herein. In certain embodiments the nanocrystal inks and films include halide-terminated (e.g., chloride-terminated) and/or halide and hydrogen-terminated nanocrystals of silicon or alloys thereof. Silicon nanocrystal inks and films can be used, for example, to prepare semiconductor devices.

Inventors:

Wheeler, Lance Michael; Kortshagen, Uwe Richard

Issue Date:

2015-09-01

Research Org.:

Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1213437

Patent Number(s):

9123538

Application Number:

13/870,554

Assignee:

Regents of the University of Minnesota (Minneapolis, MN)

Patent Classifications (CPCs):

C - CHEMISTRY C09 - DYES C09D - COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

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C - CHEMISTRY C09 - DYES C09D - COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS

C09D11/00 - Inks

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

H01L21/02612 - {Formation types}
H01L29/02 - Semiconductor bodies {

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DOE Contract Number:  

AC52-06NA25396

Resource Type:

Patent

Resource Relation:

Patent File Date: 2013 Apr 25

Country of Publication:

United States

Language:

English

Subject:

77 NANOSCIENCE AND NANOTECHNOLOGY