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Title: Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies

Abstract

A generic route for synthesis of asymmetric nanostructures. This approach utilizes submicron magnetic particles (Fe.sub.3O.sub.4--SiO.sub.2) as recyclable solid substrates for the assembly of asymmetric nanostructures and purification of the final product. Importantly, an additional SiO.sub.2 layer is employed as a mediation layer to allow for selective modification of target nanoparticles. The partially patched nanoparticles are used as building blocks for different kinds of complex asymmetric nanostructures that cannot be fabricated by conventional approaches. The potential applications such as ultra-sensitive substrates for surface enhanced Raman scattering (SERS) have been included.

Inventors:
;
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1182590
Patent Number(s):
9,040,158
Application Number:
13/621,992
Assignee:
UChicago Argonne LLC (Chicago, IL)
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE

Citation Formats

Sun, Yugang, and Hu, Yongxing. Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies. United States: N. p., 2015. Web.
Sun, Yugang, & Hu, Yongxing. Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies. United States.
Sun, Yugang, and Hu, Yongxing. Tue . "Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies". United States. https://www.osti.gov/servlets/purl/1182590.
@article{osti_1182590,
title = {Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies},
author = {Sun, Yugang and Hu, Yongxing},
abstractNote = {A generic route for synthesis of asymmetric nanostructures. This approach utilizes submicron magnetic particles (Fe.sub.3O.sub.4--SiO.sub.2) as recyclable solid substrates for the assembly of asymmetric nanostructures and purification of the final product. Importantly, an additional SiO.sub.2 layer is employed as a mediation layer to allow for selective modification of target nanoparticles. The partially patched nanoparticles are used as building blocks for different kinds of complex asymmetric nanostructures that cannot be fabricated by conventional approaches. The potential applications such as ultra-sensitive substrates for surface enhanced Raman scattering (SERS) have been included.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {5}
}

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