Microsystem enabled photovoltaic modules and systems
A microsystem enabled photovoltaic (MEPV) module including: an absorber layer; a fixed optic layer coupled to the absorber layer; a translatable optic layer; a translation stage coupled between the fixed and translatable optic layers; and a motion processor electrically coupled to the translation stage to controls motion of the translatable optic layer relative to the fixed optic layer. The absorber layer includes an array of photovoltaic (PV) elements. The fixed optic layer includes an array of quasi-collimating (QC) micro-optical elements designed and arranged to couple incident radiation from an intermediate image formed by the translatable optic layer into one of the PV elements such that it is quasi-collimated. The translatable optic layer includes an array of focusing micro-optical elements corresponding to the QC micro-optical element array. Each focusing micro-optical element is designed to produce a quasi-telecentric intermediate image from substantially collimated radiation incident within a predetermined field of view.
- Issue Date:
- OSTI Identifier:
- Sandia Corporation (Albuquerque, NM) SSO
- Patent Number(s):
- Application Number:
- Contract Number:
- Resource Relation:
- Patent File Date: 2010 Oct 28
- Research Org:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org:
- Country of Publication:
- United States
- 14 SOLAR ENERGY; 32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
Other works cited in this record:Silicon point contact concentrator solar cells
journal, August 1985
- Sinton, R. A.; Kwark, Y.; Swirhun, S.
- IEEE Electron Device Letters, Vol. 6, Issue 8, p. 405-407
Design criteria for Si point-contact concentrator solar cells
journal, October 1987
- Sinton, R. A.; Swanson, R. M.
- IEEE Transactions on Electron Devices, Vol. 34, Issue 10, p. 2116-2123
Microstructure to substrate self-assembly using capillary forces
journal, March 2001
- Srinivasan, U.; Liepmann, D.; Howe, R. T.
- Journal of Microelectromechanical Systems, Vol. 10, Issue 1, p. 17-24
Method of anisotropically etching silicon
patent, March 1996
- Laermer, Franz; Schilp, Andrea
- US Patent Document 5,501,893
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