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Title: Method of producing nanopatterned articles, and articles produced thereby

Abstract

A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media.

Inventors:
; ;
Issue Date:
Research Org.:
University of Massachusetts, Boston, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1178670
Patent Number(s):
9,018,649
Application Number:
14/048,073
Assignee:
The University of Massachusetts, Boston, MA (United States)
DOE Contract Number:  
FG02-96ER45612
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Oct 08
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Russell, Thomas P, Park, Soojin, and Xu, Ting. Method of producing nanopatterned articles, and articles produced thereby. United States: N. p., 2015. Web.
Russell, Thomas P, Park, Soojin, & Xu, Ting. Method of producing nanopatterned articles, and articles produced thereby. United States.
Russell, Thomas P, Park, Soojin, and Xu, Ting. Tue . "Method of producing nanopatterned articles, and articles produced thereby". United States. https://www.osti.gov/servlets/purl/1178670.
@article{osti_1178670,
title = {Method of producing nanopatterned articles, and articles produced thereby},
author = {Russell, Thomas P and Park, Soojin and Xu, Ting},
abstractNote = {A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {4}
}

Patent:

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