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Title: Method for characterization of a spherically bent crystal for K.alpha. X-ray imaging of laser plasmas using a focusing monochromator geometry

A method is provided for characterizing spectrometric properties (e.g., peak reflectivity, reflection curve width, and Bragg angle offset) of the K.alpha. emission line reflected narrowly off angle of the direct reflection of a bent crystal and in particular of a spherically bent quartz 200 crystal by analyzing the off-angle x-ray emission from a stronger emission line reflected at angles far from normal incidence. The bent quartz crystal can therefore accurately image argon K.alpha. x-rays at near-normal incidence (Bragg angle of approximately 81 degrees). The method is useful for in-situ calibration of instruments employing the crystal as a grating by first operating the crystal as a high throughput focusing monochromator on the Rowland circle at angles far from normal incidence (Bragg angle approximately 68 degrees) to make a reflection curve with the He-like x-rays such as the He-.alpha. emission line observed from a laser-excited plasma.
Inventors:
; ; ; ; ;
Issue Date:
OSTI Identifier:
1177502
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA) LSO
Patent Number(s):
9,001,968
Application Number:
13/662,038
Contract Number:
AC52-07NA27344
Resource Relation:
Patent File Date: 2012 Oct 26
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 74 ATOMIC AND MOLECULAR PHYSICS