skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method for the protection of extreme ultraviolet lithography optics

Abstract

A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1176379
Patent Number(s):
7740916
Application Number:
10/818,586
Assignee:
EUV LLC. (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2004 Apr 05
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 36 MATERIALS SCIENCE

Citation Formats

Grunow, Philip A., Clift, Wayne M., and Klebanoff, Leonard E.. Method for the protection of extreme ultraviolet lithography optics. United States: N. p., 2010. Web.
Grunow, Philip A., Clift, Wayne M., & Klebanoff, Leonard E.. Method for the protection of extreme ultraviolet lithography optics. United States.
Grunow, Philip A., Clift, Wayne M., and Klebanoff, Leonard E.. Tue . "Method for the protection of extreme ultraviolet lithography optics". United States. https://www.osti.gov/servlets/purl/1176379.
@article{osti_1176379,
title = {Method for the protection of extreme ultraviolet lithography optics},
author = {Grunow, Philip A. and Clift, Wayne M. and Klebanoff, Leonard E.},
abstractNote = {A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {6}
}

Patent:

Save / Share:

Works referenced in this record:

Radiation-induced protective carbon coating for extreme ultraviolet optics
journal, January 2002

  • Klebanoff, L. E.; Clift, W. M.; Malinowski, M. E.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 2
  • https://doi.org/10.1116/1.1463726