Method for the protection of extreme ultraviolet lithography optics
Abstract
A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1176379
- Patent Number(s):
- 7740916
- Application Number:
- 10/818,586
- Assignee:
- EUV LLC. (Santa Clara, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2004 Apr 05
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 36 MATERIALS SCIENCE
Citation Formats
Grunow, Philip A., Clift, Wayne M., and Klebanoff, Leonard E. Method for the protection of extreme ultraviolet lithography optics. United States: N. p., 2010.
Web.
Grunow, Philip A., Clift, Wayne M., & Klebanoff, Leonard E. Method for the protection of extreme ultraviolet lithography optics. United States.
Grunow, Philip A., Clift, Wayne M., and Klebanoff, Leonard E. Tue .
"Method for the protection of extreme ultraviolet lithography optics". United States. https://www.osti.gov/servlets/purl/1176379.
@article{osti_1176379,
title = {Method for the protection of extreme ultraviolet lithography optics},
author = {Grunow, Philip A. and Clift, Wayne M. and Klebanoff, Leonard E.},
abstractNote = {A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {6}
}
Works referenced in this record:
Radiation-induced protective carbon coating for extreme ultraviolet optics
journal, January 2002
- Klebanoff, L. E.; Clift, W. M.; Malinowski, M. E.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 2